The effect of electron irradiation on the low‐temperature emission spectra from Ge‐doped Ga0.60Al0.40As grown by liquid phase epitaxy

1981 ◽  
Vol 38 (11) ◽  
pp. 881-883 ◽  
Author(s):  
V. Swaminathan ◽  
L. C. Kimerling ◽  
W. R. Wagner
2016 ◽  
Vol 55 (4S) ◽  
pp. 04EJ13 ◽  
Author(s):  
Shuhei Funaki ◽  
Yasuji Yamada ◽  
Ryota Okunishi ◽  
Yugo Miyachi

1991 ◽  
Author(s):  
V. M. Andreev ◽  
A. B. Kazantsev ◽  
V. R. Larlonov ◽  
V. D. Rumyantsev ◽  
V. P. Khvostikov

1991 ◽  
Author(s):  
S. Johnston ◽  
E. R. Blazejewski ◽  
J. Bajaj ◽  
J. S. Chen ◽  
L. Bubulac ◽  
...  

2007 ◽  
Vol 4 (4) ◽  
pp. 1397-1400 ◽  
Author(s):  
F. Abdo ◽  
A. Fave ◽  
M. Lemiti ◽  
A. Pisch ◽  
C. Bernard

1986 ◽  
Vol 90 ◽  
Author(s):  
D. G. Knight ◽  
C. J. Miner ◽  
A. Majeed

ABSTRACTHigh purity In.53 Ga.47 As and InP with carrier concentrations [ND–NA] < 5×1015 cm−3 has been grown by the LPE technique on both n-type and semi-insulating substrates to detect and identify trace donor and acceptor impurities. Acceptor impurities have been detected in low temperature photoluminescence spectra where LPE melt baking and growth programs indicate a melt origin for two of these species, one of which is zinc. Data from semiconductor profiles provides evidence for sulfur and tin donor impurities, which comes from the rinse melt used to etch back substrates doped with the respective contaminants. Silicon and sulfur contaminants have been detected by SIMS measurements; and may arise not only from the indium and III-V materials, but also the graphite boat used to grow the epilayers. Volatile sulfur-containing compounds have been detected during high temperature bake-out of high purity graphite boats.


2004 ◽  
Vol 260 (3-4) ◽  
pp. 348-359 ◽  
Author(s):  
S.S Chandvankar ◽  
A.P Shah ◽  
A Bhattacharya ◽  
K.S Chandrasekaran ◽  
B.M Arora

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