Quantitative determination of hydrogen in silicon‐nitride films using proton‐proton scattering

P. Paduschek; P. Eichinger

doi:10.1063/1.91317

Quantitative determination of hydrogen in silicon‐nitride films using proton‐proton scattering

Applied Physics Letters ◽

10.1063/1.91317 ◽

1980 ◽

Vol 36 (1) ◽

pp. 62-63 ◽

Cited By ~ 16

Author(s):

P. Paduschek ◽

P. Eichinger

Keyword(s):

Silicon Nitride ◽

Quantitative Determination ◽

Proton Scattering ◽

Proton Proton ◽

Silicon Nitride Films

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Unique Determination of Three Proton-Proton Scattering Parameters at 9.69 MeV

Physical Review ◽

10.1103/physrev.162.884 ◽

1967 ◽

Vol 162 (4) ◽

pp. 884-889 ◽

Cited By ~ 11

Author(s):

H. Pierre Noyes ◽

H. M. Lipinski

Keyword(s):

Unique Determination ◽

Proton Scattering ◽

Scattering Parameters ◽

Proton Proton

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Determination of Hydrogen Concentration in PCVD Silicon Nitride Films by Elastic Recoil Detection Analysis

Japanese Journal of Applied Physics ◽

10.1143/jjap.26.1606 ◽

1987 ◽

Vol 26 (Part 1, No. 9) ◽

pp. 1606-1607 ◽

Cited By ~ 13

Author(s):

Mitsutoshi Takahashi ◽

Masahiko Maeda ◽

Yutaka Sakakibara

Keyword(s):

Silicon Nitride ◽

Hydrogen Concentration ◽

Elastic Recoil ◽

Elastic Recoil Detection Analysis ◽

Elastic Recoil Detection ◽

Detection Analysis ◽

Silicon Nitride Films

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Determination of the Etch Rate and the Refractive Index of Silicon Nitride Films with an Ellipsometer

Journal of The Electrochemical Society ◽

10.1149/1.2411092 ◽

1968 ◽

Vol 115 (2) ◽

pp. 227 ◽

Cited By ~ 3

Author(s):

A. N. Saxena ◽

O. Tkal

Keyword(s):

Refractive Index ◽

Silicon Nitride ◽

Etch Rate ◽

Silicon Nitride Films

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Use of analytical properties of proton-proton scattering amplitude for the determination of the nucleon-meson coupling constant

Nuclear Physics ◽

10.1016/0029-5582(63)90015-4 ◽

1963 ◽

Vol 44 ◽

pp. 173-175

Author(s):

V.I. Lendyel ◽

B.M. Ernst

Keyword(s):

Scattering Amplitude ◽

Proton Scattering ◽

Coupling Constant ◽

Proton Proton ◽

Meson Coupling ◽

Analytical Properties

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Determination of mechanical stress in the silicon nitride films with a scanning electron microscope

10.1117/12.2250118 ◽

2016 ◽

Author(s):

N. A. Djuzhev ◽

E. E. Gusev ◽

A. A. Dedkova ◽

N. Patiukov

Keyword(s):

Electron Microscope ◽

Silicon Nitride ◽

Scanning Electron Microscope ◽

Mechanical Stress ◽

Silicon Nitride Films ◽

Scanning Electron

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Determination of Silicon and Nitrogen in Semiconductor Silicon Nitride Films

Materials Transactions JIM ◽

10.2320/matertrans1989.30.184 ◽

1989 ◽

Vol 30 (3) ◽

pp. 184-187 ◽

Cited By ~ 1

Author(s):

E. Kitazume ◽

K. Usami

Keyword(s):

Silicon Nitride ◽

Semiconductor Silicon ◽

Silicon Nitride Films

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Quantitative determination of the volume fraction of intergranular amorphous phase in sintered silicon nitride

Materials Science and Engineering A ◽

10.1016/j.msea.2003.05.004 ◽

2004 ◽

Vol 370 (1-2) ◽

pp. 453-458 ◽

Cited By ~ 17

Author(s):

Gert Roebben ◽

Corneliu Sarbu ◽

Tanja Lube ◽

Omer Van der Biest

Keyword(s):

Silicon Nitride ◽

Quantitative Determination ◽

Amorphous Phase ◽

Volume Fraction ◽

Sintered Silicon

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Determination of the lateral spread of Xe ions in silicon nitride and hydrated silicon nitride films by oblique incidence Rutherford backscattering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579933 ◽

1996 ◽

Vol 14 (1) ◽

pp. 240-244 ◽

Cited By ~ 1

Author(s):

Ke‐Ming Wang ◽

Bao‐Dong Qu ◽

Bo‐Rong Shi ◽

Fei Lu ◽

Ming‐Qi Meng ◽

...

Keyword(s):

Silicon Nitride ◽

Oblique Incidence ◽

Rutherford Backscattering ◽

Lateral Spread ◽

Silicon Nitride Films

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Determination of the hydrogen concentration in silicon nitride films with the resonant nuclear reaction 1H(15N, αγ)12C

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(84)80181-0 ◽

1984 ◽

Vol 39 (12) ◽

pp. 1553-1556 ◽

Cited By ~ 4

Author(s):

E.J. Evers ◽

F.H.P.M. Habraken

Keyword(s):

Silicon Nitride ◽

Nuclear Reaction ◽

Hydrogen Concentration ◽

Silicon Nitride Films

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NOESY around the critical point Omega Tau c = 1.12. Precise determination of proton-proton distances and reorientation correlation times with two-field NOESY

Molecular Physics ◽

10.1080/002689700162621 ◽

2000 ◽

Vol 98 (4) ◽

pp. 201-210

Author(s):

Tao Zhang, Xi-An Mao, Matthias Baur, Ho

Keyword(s):

Critical Point ◽

Precise Determination ◽

Correlation Times ◽

Proton Proton

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