Negative ion beams from compact surface plasma sources and their merits for new applications

1998 ◽  
Author(s):  
S. K. Guharay
Keyword(s):  
Ion Beams ◽  
Compact Surface ◽  
Negative Ion ◽  
Surface Plasma ◽  
Plasma Sources ◽  
New Applications

Compact surface plasma sources for heavy negative ion production

2004 ◽  
Vol 75 (5) ◽  
pp. 1732-1734 ◽  
Author(s):  
Vadim Dudnikov ◽  
J. Paul Farrell
Keyword(s):  
Compact Surface ◽  
Negative Ion ◽  
Surface Plasma ◽  
Plasma Sources ◽  
Ion Production

Analysis of the factors determining the extraction of negative ion beams from plasma sources

2011 ◽  
Vol 51 (4) ◽  
pp. 043008
Author(s):  
St. Lishev ◽  
A. Shivarova ◽  
Kh. Tarnev
Keyword(s):  
Ion Beams ◽  
Negative Ion ◽  
Plasma Sources

Extraction of positive and negative ion beams from large area plasma sources

2018 ◽  
Vol 61 (1) ◽  
pp. 014031
Author(s):  
S Radovanov ◽  
A Samolov ◽  
D Distaso
Keyword(s):  
Ion Beams ◽  
Negative Ion ◽  
Large Area ◽  
Plasma Sources

Potential for improving of the compact surface plasma sources

2013 ◽  
Author(s):  
V. Dudnikov ◽  
D. Bollinger ◽  
D. Faircloth ◽  
S. Lawrie
Keyword(s):  
Compact Surface ◽  
Surface Plasma ◽  
Plasma Sources

High Current Implantation of Negative Copper Ions into Silica Glasses

1996 ◽  
Vol 438 ◽  
Author(s):  
N. Kishimoto ◽  
V. T. Gritsyna ◽  
K. Kono ◽  
H. Amekura ◽  
T. Saito
Keyword(s):  
Copper Ions ◽  
Ion Beams ◽  
Negative Ion ◽  
Fixed Dose ◽  
High Dose ◽  
High Current ◽  
Surface Plasma ◽  
Silica Glasses ◽  
Dose Rates ◽  
Optical Absorption And Reflection

AbstractHigh- current implantation of Cu- ions into silica glasses has been demonstrated using mAclass negative ion beams at 60 keV. Negative ion implantation has an advantage to alleviate specimen charging for insulating substrates and has attained high dose rates, up to 260 μA/cm2. Spherical Cu colloids form in the silica glasses without additional thermal annealing. Optical absorption and reflection of the implanted specimens vary with the current density, even at a fixed dose level. A beam- induced surface plasma may affect the high current implantation.

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