scholarly journals Dipole-induced modulation of effective work function of metal gate in junctionless FETs

AIP Advances ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 055203
Author(s):  
Xinhe Wang ◽  
Zhigang Zhang ◽  
Jianshi Tang ◽  
Bin Gao ◽  
Wen Sun ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function

Effective Work-Function Modulation by Aluminum-Ion Implantation for Metal-Gate Technology $(\hbox{Poly-Si/TiN/SiO}_{2})$

2007 ◽  
Vol 28 (12) ◽  
pp. 1089-1091 ◽  
Author(s):  
R. Singanamalla ◽  
H. Y. Yu ◽  
B. Van Daele ◽  
S. Kubicek ◽  
K. De Meyer
Keyword(s):  
Ion Implantation ◽  
Work Function ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
Aluminum Ion

Investigating doping effects on high-κ metal gate stack for effective work function engineering

2013 ◽  
Vol 88 ◽  
pp. 21-26 ◽  
Author(s):  
C. Leroux ◽  
S. Baudot ◽  
M. Charbonnier ◽  
A. Van Der Geest ◽  
P. Caubet ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Gate Stack ◽  
Effective Work ◽  
Effective Work Function ◽  
Doping Effects

Thermally stable high effective work function TaCN thin films for metal gate electrode applications

2009 ◽  
Vol 105 (5) ◽  
pp. 053516 ◽  
Author(s):  
C. Adelmann ◽  
J. Meersschaut ◽  
L.-Å. Ragnarsson ◽  
T. Conard ◽  
A. Franquet ◽  
...  
Keyword(s):  
Thin Films ◽  
Work Function ◽  
Thermally Stable ◽  
Gate Electrode ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function

Effective work-function control technique applicable to p-type FinFET high-k/metal gate devices

2017 ◽  
Vol 72 ◽  
pp. 80-84 ◽  
Author(s):  
Shimpei Yamaguchi ◽  
Zeynel Bayindir ◽  
Xiaoli He ◽  
Suresh Uppal ◽  
Purushothaman Srinivasan ◽  
...  
Keyword(s):  
Work Function ◽  
Control Technique ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
High K ◽  
P Type

The effects of process condition of top-TiN and TaN thickness on the effective work function of MOSCAP with high-k/metal gate stacks

2014 ◽  
Vol 35 (10) ◽  
pp. 106002 ◽  
Author(s):  
Xueli Ma ◽  
Hong Yang ◽  
Wenwu Wang ◽  
Huaxiang Yin ◽  
Huilong Zhu ◽  
...  
Keyword(s):  
Work Function ◽  
Process Condition ◽  
Gate Stacks ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
High K

An effective work-function tuning method of nMOSCAP with high-k/metal gate by TiN/TaN double-layer stack thickness

2014 ◽  
Vol 35 (9) ◽  
pp. 096001 ◽  
Author(s):  
Xueli Ma ◽  
Hong Yang ◽  
Wenwu Wang ◽  
Huaxiang Yin ◽  
Huilong Zhu ◽  
...  
Keyword(s):  
Work Function ◽  
Double Layer ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
Tuning Method ◽  
High K ◽  
Work Function Tuning

Role of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation

2009 ◽  
Vol 94 (25) ◽  
pp. 252905 ◽  
Author(s):  
Z. C. Yang ◽  
A. P. Huang ◽  
L. Yan ◽  
Z. S. Xiao ◽  
X. W. Zhang ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
Interface Dipole ◽  
High K
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