scholarly journals Band structure, effective mass, and carrier mobility of few-layer h-AlN under layer and strain engineering

APL Materials ◽  
2020 ◽  
Vol 8 (2) ◽  
pp. 021107 ◽  
Author(s):  
Yao Cai ◽  
Yan Liu ◽  
Ying Xie ◽  
Yang Zou ◽  
Chao Gao ◽  
...  
2018 ◽  
Vol 11 (9) ◽  
pp. 2486-2495 ◽  
Author(s):  
Yu Xiao ◽  
Haijun Wu ◽  
Juan Cui ◽  
Dongyang Wang ◽  
Liangwei Fu ◽  
...  

Synergistically optimizing the band structure and introducing point defects lead to remarkably high ZT in n-type PbTe–MnTe.


1999 ◽  
Vol 59 (3) ◽  
pp. 2057-2062 ◽  
Author(s):  
A. Bruno-Alfonso ◽  
F. J. Ribeiro ◽  
A. Latgé ◽  
L. E. Oliveira

2017 ◽  
Vol 5 (23) ◽  
pp. 5772-5779 ◽  
Author(s):  
Viet-Anh Ha ◽  
Francesco Ricci ◽  
Gian-Marco Rignanese ◽  
Geoffroy Hautier

We demonstrate through first principles computations how the metal–oxygen–metal angle directly drives the hole effective mass (thus the carrier mobility) in p-type s-orbital-based oxides.


2020 ◽  
Vol 22 (2) ◽  
pp. 914-918 ◽  
Author(s):  
Zongbao Li ◽  
Xinsheng Liu ◽  
Xia Wang ◽  
Yusi Yang ◽  
Shun-Chang Liu ◽  
...  

The anisotropic ratio of the effective mass and mobility of charge carriers of GeSe monolayer along two principle axes can be controlled by using simple strain conditions.


1970 ◽  
Vol 1 (1) ◽  
pp. 305-314 ◽  
Author(s):  
Joseph Callaway ◽  
H. M. Zhang

MRS Advances ◽  
2019 ◽  
Vol 4 (5-6) ◽  
pp. 351-357 ◽  
Author(s):  
Erin I. Vaughan ◽  
Clay S. Mayberry ◽  
Danhong Huang ◽  
Ashwani K. Sharma

ABSTRACTThe behavior of electron and hole transport in semiconductor materials is influenced by lattice-mismatch at the interface. It is well known that carrier scattering in a confined region is dramatically reduced. In this work, we studied the effects of coupling both the strain and confinement simultaneously. We report on the fabrication and characterization of nanoscale planar, wall-like, and wire-like Si/SiO2 structures. As the Si nanostructure dimensions were scaled down to the quantum regime by thermal oxidation of the Si, changes to the band structure and carrier effective mass were observed by both optical and electrical techniques. Transient-time response measurements were performed to examine the carrier generation and recombination behavior as a function of scaling. Signal rise times decreased for both carrier types by an order of magnitude as Si dimensions were reduced from 200 to 10 nm, meaning that the carrier velocity is increasing with smaller scale structures. This result is indicative of decreased Si bandgap energy and carrier effective mass. Photoluminescence measurements taken at 50K showed changes in the PL response peak energies, which illustrates changes in the band structure, as the Si/SiO2 dimensions are scaled.


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