scholarly journals Control of etch pit formation for epitaxial growth of graphene on germanium

2019 ◽  
Vol 126 (8) ◽  
pp. 085306 ◽  
Author(s):  
Andreas Becker ◽  
Christian Wenger ◽  
Jarek Dabrowski
Keyword(s):  
Epitaxial Growth ◽  
Etch Pit ◽  
Pit Formation

Etch pit formation on metal films by wet chemicals

1999 ◽  
Vol 5 (1) ◽  
pp. 39-42 ◽  
Author(s):  
Chongmu Lee
Keyword(s):  
Metal Films ◽  
Etch Pit ◽  
Pit Formation

Etch-pit formation mechanism induced on HPHT and CVD diamond single crystals by H2 /O2 plasma etching treatment

2012 ◽  
Vol 209 (9) ◽  
pp. 1715-1720 ◽  
Author(s):  
M. Naamoun ◽  
A. Tallaire ◽  
F. Silva ◽  
J. Achard ◽  
P. Doppelt ◽  
...  
Keyword(s):  
Single Crystals ◽  
Formation Mechanism ◽  
Plasma Etching ◽  
Cvd Diamond ◽  
Etch Pit ◽  
Pit Formation ◽  
Diamond Single Crystals ◽  
O2 Plasma

Dislocation Etch Pit Formation on Cadmium Crystal

1973 ◽  
Vol 12 (10) ◽  
pp. 1647-1648 ◽  
Author(s):  
Hironobu Nishikawa
Keyword(s):  
Etch Pit ◽  
Pit Formation ◽  
Dislocation Etch

Effects of Pretreatment on the Etch Pit Formation during the Electrochemical Etching of Aluminum

2007 ◽  
Vol 124-126 ◽  
pp. 1561-1564
Author(s):  
Jae Kwang Lee ◽  
Yun Ho Shin ◽  
Jin Wook Kang ◽  
Yong Sug Tak
Keyword(s):  
Electrochemical Etching ◽  
High Density ◽  
Aluminum Surface ◽  
Etch Pits ◽  
Phosphate Ion ◽  
Etch Pit ◽  
Pit Formation ◽  
Fluorosilicic Acid ◽  
Etching Behavior ◽  
Chemical Pretreatments

The effect of chemical pretreatments on the electrochemical etching behavior of aluminum was investigated with the topographic studies of surface and the analysis of initial potential transients. Two-step pretreatments with H3PO4 and H2SiF6 result in a high density of pre-etch pits on aluminum surface by the incorporation of phosphate ion inside the oxide film and the removal of surface layer by aggressive fluorosilicic acid solution. It generates a high density of etch pits during electrochemical etching and results in the capacitance increase of etched Al electrode by expanding the surface area, up to 61.3 μF/cm2 with the pretreatment solution of 0.5M H3PO4 at 65°C and 10 mM H2SiF6 at 45°C.

Effects of pretreatment on the aluminium etch pit formation

2009 ◽  
Vol 51 (7) ◽  
pp. 1501-1505 ◽  
Author(s):  
Jaekwang Lee ◽  
Jiyoung Kim ◽  
Jutae Kim ◽  
Junhee Lee ◽  
Hwayong Chung ◽  
...  
Keyword(s):  
Etch Pit ◽  
Pit Formation

Effect of Oxygen on Etch‐Pit Formation in Silicon

1957 ◽  
Vol 28 (12) ◽  
pp. 1419-1423 ◽  
Author(s):  
R. A. Logan ◽  
A. J. Peters
Keyword(s):  
Etch Pit ◽  
Pit Formation ◽  
Effect Of Oxygen

Some observations on the relationship between etch-pit form and structure in biotite

Clay Minerals ◽  
1985 ◽  
Vol 20 (2) ◽  
pp. 263-271 ◽  
Author(s):  
J. A. Medina ◽  
M. Morante ◽  
S. Leguey ◽  
J. Tornero
Keyword(s):  
Epitaxial Growth ◽  
Iron Content ◽  
Chemical Compositions ◽  
Previous Knowledge ◽  
Structural Explanation ◽  
High Iron Content ◽  
High Iron ◽  
Etch Pit ◽  
The Relationship

The object of this study was to find a structural explanation for the corrosion figures produced in biotites having different chemical compositions and to apply this information to other di- or trioctahedral micas. The biotites investigated were used in earlier studies of epitaxial growth, so that previous knowledge of their surface behaviour was available. The biotites studied were from Evje, Norway (number 1), Guomum, Czechoslovakia (number 2), and Tanokami Yama, Japan (number 3). All were very dark in colour due to their high iron content.

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