Effect of Oxygen on Etch‐Pit Formation in Silicon

1957 ◽  
Vol 28 (12) ◽  
pp. 1419-1423 ◽  
Author(s):  
R. A. Logan ◽  
A. J. Peters
Keyword(s):  
Etch Pit ◽  
Pit Formation ◽  
Effect Of Oxygen

Etch pit formation on metal films by wet chemicals

1999 ◽  
Vol 5 (1) ◽  
pp. 39-42 ◽  
Author(s):  
Chongmu Lee
Keyword(s):  
Metal Films ◽  
Etch Pit ◽  
Pit Formation

Etch-pit formation mechanism induced on HPHT and CVD diamond single crystals by H2 /O2 plasma etching treatment

2012 ◽  
Vol 209 (9) ◽  
pp. 1715-1720 ◽  
Author(s):  
M. Naamoun ◽  
A. Tallaire ◽  
F. Silva ◽  
J. Achard ◽  
P. Doppelt ◽  
...  
Keyword(s):  
Single Crystals ◽  
Formation Mechanism ◽  
Plasma Etching ◽  
Cvd Diamond ◽  
Etch Pit ◽  
Pit Formation ◽  
Diamond Single Crystals ◽  
O2 Plasma

Dislocation Etch Pit Formation on Cadmium Crystal

1973 ◽  
Vol 12 (10) ◽  
pp. 1647-1648 ◽  
Author(s):  
Hironobu Nishikawa
Keyword(s):  
Etch Pit ◽  
Pit Formation ◽  
Dislocation Etch

Effects of Pretreatment on the Etch Pit Formation during the Electrochemical Etching of Aluminum

2007 ◽  
Vol 124-126 ◽  
pp. 1561-1564
Author(s):  
Jae Kwang Lee ◽  
Yun Ho Shin ◽  
Jin Wook Kang ◽  
Yong Sug Tak
Keyword(s):  
Electrochemical Etching ◽  
High Density ◽  
Aluminum Surface ◽  
Etch Pits ◽  
Phosphate Ion ◽  
Etch Pit ◽  
Pit Formation ◽  
Fluorosilicic Acid ◽  
Etching Behavior ◽  
Chemical Pretreatments

The effect of chemical pretreatments on the electrochemical etching behavior of aluminum was investigated with the topographic studies of surface and the analysis of initial potential transients. Two-step pretreatments with H3PO4 and H2SiF6 result in a high density of pre-etch pits on aluminum surface by the incorporation of phosphate ion inside the oxide film and the removal of surface layer by aggressive fluorosilicic acid solution. It generates a high density of etch pits during electrochemical etching and results in the capacitance increase of etched Al electrode by expanding the surface area, up to 61.3 μF/cm2 with the pretreatment solution of 0.5M H3PO4 at 65°C and 10 mM H2SiF6 at 45°C.

Effects of pretreatment on the aluminium etch pit formation

2009 ◽  
Vol 51 (7) ◽  
pp. 1501-1505 ◽  
Author(s):  
Jaekwang Lee ◽  
Jiyoung Kim ◽  
Jutae Kim ◽  
Junhee Lee ◽  
Hwayong Chung ◽  
...  
Keyword(s):  
Etch Pit ◽  
Pit Formation

High-resolution imaging of biotite dissolution and measurement of activation energy

2008 ◽  
Vol 72 (1) ◽  
pp. 115-120 ◽  
Author(s):  
T. J. McMaster ◽  
M. M. Smits ◽  
S. J. Haward ◽  
J. R. Leake ◽  
S. Banwart ◽  
...  
Keyword(s):  
Activation Energy ◽  
Data Sets ◽  
Ambient Conditions ◽  
Contact Mode ◽  
Force Microscopy ◽  
Etch Pit ◽  
Pit Formation ◽  
Atomic Force ◽  
Diffusion Controlled ◽  
Liquid Cell

AbstractWe have used a direct imaging technique, in situ atomic force microscopy(AFM) to observe the earliest stages of the dissolution of a biotite surface byoxalic acid at temperatures close to ambient conditions, using a speciallydesigned AFM liquid cell and non-invasive intermittent contact mode of operation. From the nm-resolution data sets in x, yand z dimensions, we have measured dissolution rates and determined activation energies for the process as a function of temperature, via a mass-loss calculation. The value of Ea obtained, 49±2 kJ mol-1, appears to be too high to indicate a diffusion-controlled process and is more in line with expectations based on a process limited by the rate of ligand-induced metal cation detachment from the (001) surface. This is consistent with visual observations of the relative rates of etch-pit formation and growth, and accepted knowledge of the biotite crystal structure. Separate calculations based on planar area etch-pit growth, and measurements of etch-pit perimeters confirm this result, and also indicate substantiallyhigher activation energy, up to 80 kJ mol-1, when the edge pits are in an incipient stage.

Digital Image Analysis of Etch Pit Formation in CR-39 Track Detector

2008 ◽  
Vol 47 (1) ◽  
pp. 269-272 ◽  
Author(s):  
Fuminobu Sato ◽  
Takahiro Kuchimaru ◽  
Yushi Kato ◽  
Toshiyuki Iida
Keyword(s):  
Image Analysis ◽  
Digital Image ◽  
Digital Image Analysis ◽  
Track Detector ◽  
Etch Pit ◽  
Pit Formation
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