Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition
Keyword(s):
Keyword(s):
2011 ◽
Vol 50
(6S)
◽
pp. 06GE04
◽
Keyword(s):
Keyword(s):
2012 ◽
Vol 116
(19)
◽
pp. 10557-10562
◽
Keyword(s):
2011 ◽
Vol 50
(6)
◽
pp. 06GE04
◽
Keyword(s):
2011 ◽
Vol 115
(37)
◽
pp. 10290-10298
◽
2017 ◽
Vol 121
(47)
◽
pp. 26465-26471
◽
Keyword(s):