Flow-Tube Kinetics of Gas-Phase Chemical Vapor Deposition Reactions: TiN from Ti(NMe2)4 and NH3

1994 ◽  
Vol 6 (3) ◽  
pp. 260-261 ◽  
Author(s):  
Bruce H. Weiller ◽  
Brenda V. Partido
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Flow Tube ◽  
Kinetics Of ◽  
Phase Chemical

Chemical Kinetics of Photoinduced Chemical Vapor Deposition: Silica Coating of Gas-Phase Nanoparticles

2011 ◽  
Vol 116 (1) ◽  
pp. 104-114 ◽  
Author(s):  
Adam M. Boies ◽  
Steven Calder ◽  
Pulkit Agarwal ◽  
Pingyan Lei ◽  
Steven L. Girshick
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Chemical Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Coating ◽  
Kinetics Of

scholarly journals Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition

APL Materials ◽  
2019 ◽  
Vol 7 (8) ◽  
pp. 081113 ◽  
Author(s):  
Nitin Babu Shinde ◽  
Bellarmine Francis ◽  
M. S. Ramachandra Rao ◽  
Beo Deul Ryu ◽  
S. Chandramohan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Layer Thickness ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Layer By Layer ◽  
Thickness Control ◽  
Wafer Scale ◽  
Phase Chemical

Thermodynamics and kinetics of initial gas phase reactions in chemical vapor deposition of titanium nitride. Theoretical study of TiCl4 ammonolysis

2001 ◽  
Vol 22 (13) ◽  
pp. 1366-1376 ◽  
Author(s):  
Stanislav Ya. Umanskii ◽  
Konstantin P. Novoselov ◽  
Airat Kh. Minushev ◽  
Magdalena Siodmiak ◽  
Gernot Frenking ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Nitride ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Theoretical Study ◽  
Chemical Vapor ◽  
Gas Phase Reactions ◽  
Thermodynamics And Kinetics ◽  
Kinetics Of

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

scholarly journals Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition

RSC Advances ◽  
2021 ◽  
Vol 11 (30) ◽  
pp. 18493-18499
Author(s):  
Sergio Sánchez-Martín ◽  
S. M. Olaizola ◽  
E. Castaño ◽  
E. Urionabarrenetxea ◽  
G. G. Mandayo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Kinetics Analysis ◽  
Deposition Parameters ◽  
Kinetics Of

Impact of deposition parameters, microstructure and growth kinetics analysis of ZnO grown by Aerosol-assisted Chemical Vapor Deposition (AACVD).

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