Synthesis of phase pure vanadium dioxide (VO2) thin film by reactive pulsed laser deposition

2018 ◽  
Vol 124 (13) ◽  
pp. 135301 ◽  
Author(s):  
Devanshi Bhardwaj ◽  
Ankur Goswami ◽  
A. M. Umarji
2009 ◽  
Vol 46 (6) ◽  
pp. 49-53
Author(s):  
王海方 Wang Haifang ◽  
李毅 Li Yi ◽  
蒋群杰 Jiang Qunjie ◽  
俞晓静 Yu Xiaojing ◽  
胡双双 Hu Shuangshuang ◽  
...  

2006 ◽  
Vol 320 ◽  
pp. 45-48
Author(s):  
Hyun Young Go ◽  
Naoki Wakiya ◽  
Keisuke Satoh ◽  
Masao Kondo ◽  
Jeffrey S. Cross ◽  
...  

In this study, BiFeO3 (BFO) epitaxial film was deposited on SrRuO3 (100)/SrTiO3 (100) substrates using pulsed laser deposition (PLD). Phase pure BFO thin film was obtained. Introducing a mask between the target and substrate in PLD improved the surface roughness from 47.8 nm (RMS, without mask) to 7.7 nm (RMS, with mask). The composition and electrical properties of BFO thin film were assessed after annealing for 1 h in Ar, N2, or O2 atmosphere at 600°C. The P-E hysteresis properties improved only in the O2 atmosphere. After annealing under O2 atmosphere, the leakage current decreased from 6.1 × 10-2 A/cm to 2.9 × 10-2 A/cm at 200 kV/cm, as in the other annealing atmospheres, but 2Pr increased from 35 BC/cm2 to 50 BC/cm2.


2000 ◽  
Vol 76 (18) ◽  
pp. 2490-2492 ◽  
Author(s):  
P. A. Atanasov ◽  
R. I. Tomov ◽  
J. Perriére ◽  
R. W. Eason ◽  
N. Vainos ◽  
...  

2006 ◽  
Vol 89 (18) ◽  
pp. 182906 ◽  
Author(s):  
Sang-A Lee ◽  
Jae-Yeol Hwang ◽  
Jong-Pil Kim ◽  
Se-Young Jeong ◽  
Chae-Ryong Cho

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