Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO highly conductive thin films at low-temperature

Bibhuti Bhusan Sahu; Su Bong Jin; Piao Jin Xiang; Jay Bum Kim; Jeon Geon Han

doi:10.1063/1.5022708

Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO highly conductive thin films at low-temperature

Journal of Applied Physics ◽

10.1063/1.5022708 ◽

2018 ◽

Vol 123 (20) ◽

pp. 205107 ◽

Cited By ~ 5

Author(s):

Bibhuti Bhusan Sahu ◽

Su Bong Jin ◽

Piao Jin Xiang ◽

Jay Bum Kim ◽

Jeon Geon Han

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Plasma Parameters ◽

Inductively Coupled ◽

Doped Zno ◽

Conductive Thin Films

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Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.07.086 ◽

2010 ◽

Vol 205 ◽

pp. S227-S230 ◽

Cited By ~ 6

Author(s):

Kyung S. Shin ◽

Yoon S. Choi ◽

In S. Choi ◽

Y. Setsuhara ◽

Jeon G. Han

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Nano Crystalline

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Inductively coupled plasma post-treatment of Al-doped ZnO thin films

Current Applied Physics ◽

10.1016/j.cap.2011.01.050 ◽

2011 ◽

Vol 11 (4) ◽

pp. S30-S32 ◽

Cited By ~ 3

Author(s):

Kyu Seomoon ◽

Joonyeong Kim ◽

Suyong Ju ◽

Pyungwoo Jang ◽

Kwang-Ho Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Post Treatment ◽

Zno Thin Films ◽

Inductively Coupled ◽

Doped Zno

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Highly doped p-type microcrystalline silicon thin films fabricated by a low-frequency inductively coupled plasma at a low temperature

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/34/345401 ◽

2011 ◽

Vol 44 (34) ◽

pp. 345401 ◽

Cited By ~ 4

Author(s):

W S Yan ◽

D Y Wei ◽

S Xu ◽

C C Sern ◽

H P Zhou

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

P Type

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Low-temperature preparation of phosphorus doped μc-Si:H thin films by low-frequency inductively coupled plasma assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2011.08.048 ◽

2012 ◽

Vol 520 (6) ◽

pp. 1724-1728 ◽

Cited By ~ 4

Author(s):

W.S. Yan ◽

D.Y. Wei ◽

Y.N. Guo ◽

S. Xu ◽

T.M. Ong ◽

...

Keyword(s):

Thin Films ◽

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Inductively Coupled ◽

Low Temperature Preparation ◽

Phosphorus Doped ◽

Temperature Preparation

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Low-temperature deposition of µc-Si : H thin films by a low-frequency inductively coupled plasma for photovoltaic applications

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/46/21/215501 ◽

2013 ◽

Vol 46 (21) ◽

pp. 215501 ◽

Cited By ~ 9

Author(s):

D Y Wei ◽

S Q Xiao ◽

S Y Huang ◽

C S Chan ◽

H P Zhou ◽

...

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Inductively Coupled ◽

Low Temperature Deposition ◽

Photovoltaic Applications ◽

Temperature Deposition

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Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma

AIP Advances ◽

10.1063/6.0000883 ◽

2021 ◽

Vol 11 (2) ◽

pp. 025027

Author(s):

Nayeon Lee ◽

Ohyung Kwon ◽

Chin-Wook Chung

Keyword(s):

Inductively Coupled Plasma ◽

Plasma Parameters ◽

Inductively Coupled ◽

Ar Plasma

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Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

10.1063/5.0016897 ◽

2020 ◽

Author(s):

Sucharita Saha ◽

Debajyoti Das

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Low Pressure ◽

High Density ◽

Nanocrystalline Diamond ◽

Plasma Cvd ◽

Inductively Coupled ◽

Diamond Thin Films

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Comparison of pneumatic and ultrasonic nebulizations in inductively coupled plasma atomic emission spectrometry — matrix effects and plasma parameters

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/j.sab.2006.04.005 ◽

2006 ◽

Vol 61 (5) ◽

pp. 579-587 ◽

Cited By ~ 28

Author(s):

Jolanta Borkowska-Burnecka ◽

Anna Leśniewicz ◽

Wiesław Żyrnicki

Keyword(s):

Inductively Coupled Plasma ◽

Matrix Effects ◽

Atomic Emission ◽

Atomic Emission Spectrometry ◽

Emission Spectrometry ◽

Plasma Atomic Emission ◽

Plasma Atomic Emission Spectrometry ◽

Plasma Parameters ◽

Inductively Coupled

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Thin Solid Films ◽

10.1016/j.tsf.2006.10.087 ◽

2007 ◽

Vol 515 (12) ◽

pp. 4955-4959 ◽

Cited By ~ 6

Author(s):

Gwan-Ha Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Buffer Layer ◽

Magnesium Oxide ◽

Inductively Coupled Plasma ◽

Dry Etching ◽

Oxide Thin Films ◽

Inductively Coupled ◽

Mfis Structure

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