Recent H− diagnostics, plasma simulations, and 2X scaled Penning ion source developments at the Rutherford Appleton Laboratory

2018 ◽  
Vol 89 (5) ◽  
pp. 052101 ◽  
Author(s):  
S. R. Lawrie ◽  
D. C. Faircloth ◽  
J. D. Smith ◽  
T. M. Sarmento ◽  
M. O. Whitehead ◽  
...  
2010 ◽  
Vol 81 (2) ◽  
pp. 02A721 ◽  
Author(s):  
D. C. Faircloth ◽  
S. Lawrie ◽  
A. P. Letchford ◽  
C. Gabor ◽  
P. Wise ◽  
...  

2002 ◽  
Vol 20 (4) ◽  
pp. 569-575 ◽  
Author(s):  
J.-L. VAY ◽  
P. COLELLA ◽  
P. McCORQUODALE ◽  
B. VAN STRAALEN ◽  
A. FRIEDMAN ◽  
...  

The numerical simulation of the driving beams in a heavy ion fusion power plant is a challenging task, and simulation of the power plant as a whole, or even of the driver, is not yet possible. Despite the rapid progress in computer power, past and anticipated, one must consider the use of the most advanced numerical techniques, if we are to reach our goal expeditiously. One of the difficulties of these simulations resides in the disparity of scales, in time and in space, which must be resolved. When these disparities are in distinctive zones of the simulation region, a method which has proven to be effective in other areas (e.g., fluid dynamics simulations) is the mesh refinement technique. We discuss the challenges posed by the implementation of this technique into plasma simulations (due to the presence of particles and electromagnetic waves). We present the prospects for and projected benefits of its application to heavy ion fusion, in particular to the simulation of the ion source and the final beam propagation in the chamber. A collaboration project is under way at Lawrence Berkeley National Laboratory between the Applied Numerical Algorithms Group (ANAG) and the Heavy Ion Fusion group to couple the adaptive mesh refinement library CHOMBO developed by the ANAG group to the particle-in-cell accelerator code WARP developed by the Heavy Ion Fusion–Virtual National Laboratory. We describe our progress and present our initial findings.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.


1986 ◽  
Vol 47 (C6) ◽  
pp. C6-71-C6-79 ◽  
Author(s):  
M. H. KEY ◽  
J. E. BOON ◽  
C. BROWN ◽  
C. CHENAIS-POPOVICS ◽  
R. CORBETT ◽  
...  

1989 ◽  
Vol 50 (C8) ◽  
pp. C8-175-C8-177 ◽  
Author(s):  
N. M. MISKOVSKY ◽  
J. HE ◽  
P. H. CUTLER ◽  
M. CHUNG
Keyword(s):  

1989 ◽  
Vol 50 (C1) ◽  
pp. C1-807-C1-811 ◽  
Author(s):  
P. McNEELY ◽  
G. ROY ◽  
J. SOUKUP ◽  
J. M. D'AURIA ◽  
L. BUCHMANN ◽  
...  

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