A review of recent H− ion source work at Rutherford Appleton Laboratory

2002 ◽  
Author(s):  
J. W. G. Thomason
Keyword(s):  
Ion Source ◽  
Rutherford Appleton Laboratory

The front end test stand high performance H− ion source at Rutherford Appleton Laboratory

2010 ◽  
Vol 81 (2) ◽  
pp. 02A721 ◽  
Author(s):  
D. C. Faircloth ◽  
S. Lawrie ◽  
A. P. Letchford ◽  
C. Gabor ◽  
P. Wise ◽  
...  
Keyword(s):  
High Performance ◽  
Ion Source ◽  
Test Stand ◽  
Rutherford Appleton Laboratory ◽  
Front End

Recent H− diagnostics, plasma simulations, and 2X scaled Penning ion source developments at the Rutherford Appleton Laboratory

2018 ◽  
Vol 89 (5) ◽  
pp. 052101 ◽  
Author(s):  
S. R. Lawrie ◽  
D. C. Faircloth ◽  
J. D. Smith ◽  
T. M. Sarmento ◽  
M. O. Whitehead ◽  
...  
Keyword(s):  
Ion Source ◽  
Rutherford Appleton Laboratory ◽  
Plasma Simulations

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

STUDY OF X-RAY LASER SCHEMES USING NEW EXPERIMENTAL FACILITIES AT THE RUTHERFORD APPLETON LABORATORY

1986 ◽  
Vol 47 (C6) ◽  
pp. C6-71-C6-79 ◽  
Author(s):  
M. H. KEY ◽  
J. E. BOON ◽  
C. BROWN ◽  
C. CHENAIS-POPOVICS ◽  
R. CORBETT ◽  
...  
Keyword(s):  
Rutherford Appleton Laboratory ◽  
X Ray ◽  
Experimental Facilities

A HYDRODYNAMICAL STUDY OF THE INSTABILITY OF A PLANAR LIQUID METAL ION SOURCE (SUMMARY)

1989 ◽  
Vol 50 (C8) ◽  
pp. C8-175-C8-177 ◽  
Author(s):  
N. M. MISKOVSKY ◽  
J. HE ◽  
P. H. CUTLER ◽  
M. CHUNG
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Ion Source

AN ECR ION SOURCE FOR RADIOACTIVE BEAMS AT TRIUMF

1989 ◽  
Vol 50 (C1) ◽  
pp. C1-807-C1-811 ◽  
Author(s):  
P. McNEELY ◽  
G. ROY ◽  
J. SOUKUP ◽  
J. M. D'AURIA ◽  
L. BUCHMANN ◽  
...  
Keyword(s):  
Ion Source ◽  
Ecr Ion Source ◽  
Radioactive Beams
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