Effect of annealing on the optical properties of the ion beam sputtered NiO thin film

2017 ◽  
Author(s):  
Romita Chouhan ◽  
Priyanka Baraskar ◽  
Tanveer A. Dar ◽  
Arpana Agrawal ◽  
Mukul Gupta ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Nio Thin Film

Effect of Thickness Affecting Optical Properties of Ge Thin Film Preparing by Ultra Vacuum Ion Beam Sputtering

2010 ◽  
Vol 57 (5B) ◽  
pp. 1197-1199 ◽  
Author(s):  
Yen-Hsun Su ◽  
Sheng-Lung Tu ◽  
Ho-Tung Lin ◽  
Chun-Chieh Huang
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Optical properties of dense thin‐film Si and Ge prepared by ion‐beam sputtering

1985 ◽  
Vol 58 (2) ◽  
pp. 954-957 ◽  
Author(s):  
R. W. Collins ◽  
H. Windischmann ◽  
J. M. Cavese ◽  
J. Gonzalez‐Hernandez
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Structure and optical properties of nanocrystalline NiO thin film synthesized by sol–gel spin-coating method

2009 ◽  
Vol 486 (1-2) ◽  
pp. 9-13 ◽  
Author(s):  
A.A. Al-Ghamdi ◽  
Waleed E. Mahmoud ◽  
S.J. Yaghmour ◽  
F.M. Al-Marzouki
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Spin Coating ◽  
Sol Gel ◽  
Spin Coating Method ◽  
Nio Thin Film ◽  
Coating Method

Atmospheric Stability of E-Beam Deposited Optical Thin Film Stacks

2004 ◽  
Vol 854 ◽  
Author(s):  
Ping Hou ◽  
Lianchao Sun ◽  
Fei Luo
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Electron Beam ◽  
Ambient Temperature ◽  
Ion Beam ◽  
Atmospheric Stability ◽  
Optical Devices ◽  
Atmospheric Environment ◽  
Profile Changes

ABSTRACTOptical thin films with SiO2-TiO2 stack were prepared by the technology of electron beam (e-beam) evaporation with ion beam assistant deposition (IBAD). The mechanical (stress) and optical properties of as-deposited thin films were studied as a function of exposure time in the atmospheric environment. Exposing to the air at the ambient temperature causes incremental compressive stress and spectrum profile changes, which is related to the absorption of water moisture into the films. Making a dense film is, therefore, a practical approach to improve structural stability of thin films and then the performance of optical devices.

Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering

2018 ◽  
Vol 47 (3) ◽  
pp. 321004
Author(s):  
王利栓 Wang Lishuan ◽  
杨霄 Yang Xiao ◽  
刘丹丹 Liu Dandan ◽  
姜承慧 Jiang Chenghui ◽  
刘华松 Liu Huasong ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Tantalum Oxide ◽  
Annealing Effect ◽  
Oxide Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

scholarly journals Morphological characterization and porosity profiles of tantalum glancing-angle-deposited thin films

2020 ◽  
Vol 9 (1) ◽  
pp. 79-87
Author(s):  
Tobias Ott ◽  
Gerald Gerlach
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Physical Vapor Deposition ◽  
Effective Medium Theory ◽  
Layer Structure ◽  
Ion Beam ◽  
Periodic Pattern ◽  
Sem Images ◽  
Glancing Angle

Abstract. Glancing angle deposition (GLAD) is a physical vapor deposition (PVD) process using a substrate that rotates tilted at an angle to the evaporation source. Depending on the deposition conditions, it provides the controlled formation of regular nanostructures during the PVD process. As a result, a wide variety of shapes, such as spirals or vertical columns, can be easily fabricated in the nanometer range. For this reason, GLAD has already been proven reliable in the production of optical coatings with very low reflectance in a broad spectral range. This paper examines the morphology of tantalum nanostructures deposited on planar silicon substrates by electron beam evaporation. The prepared samples are characterized by scanning electron microscope (SEM) images at a breaking edge with respect to the layer structure and by focused ion beam (FIB) SEM images of the cross-sectional areas with respect to the porosity. The porosity can be used to model the optical properties of the thin film with the effective medium theory (EMT). Our work studies the relationship between the evaporation parameters (growth pitch and deposition angle) and thin film morphology of tantalum so that in future work the optical properties can be linked to the deposition parameters, which in turn can be chosen to achieve highly absorbent infrared radiation layers, e.g., for infrared sensors. It was shown that the porosity across the film thickness of both columnar and screw-like thin films is nearly constant, whereas the porosity profiles of spiral structures show a periodic pattern, the period of which seems to depend on the growth pitch.

Physical and Optical Properties of The Films Ð’i2Te3-Bi2Se3

2015 ◽  
Vol 11 (2) ◽  
pp. 3017-3022
Author(s):  
Gurban Akhmedov
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Surface Temperature ◽  
Thermal Evaporation ◽  
Low Voltage ◽  
Internal Surface ◽  
Differential Resistance ◽  
Work Cycle

Results of researches show, that film p-n the structures received by a method of discrete thermal evaporation in a uniform work cycle, are suitable for use in low-voltage devices.  As a result of work are received p-n heterojunctions in thin-film execution, described by high values of differential resistance. Show that, thermo endurance - T0 maybe using as characteristic of thermo endurance of optic materials. If heating flow, destruction temperature and internal surface temperature is measured during test, it is possible to determine value T0 and other necessity characteristics. As a result of the taking test was lead to comparison evaluation of considered materials. Working range of heating flow and up level heating embark have been determined.

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