A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges

2017 ◽  
Vol 121 (17) ◽  
pp. 171901 ◽  
Author(s):  
B. C. Zheng ◽  
Z. L. Wu ◽  
B. Wu ◽  
Y. G. Li ◽  
M. K. Lei
Keyword(s):  
Magnetron Sputtering ◽  
Pulsed Power ◽  
Plasma Model ◽  
Reactive Deposition

scholarly journals Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS)

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 239-251
Author(s):  
Masaomi Sanekata ◽  
Hiroshi Nishida ◽  
Tatsuya Watabe ◽  
Yuki Nakagomi ◽  
Yoshihiro Hirai ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Discharge Current ◽  
Electrical Breakdown ◽  
Pulsed Power ◽  
Current Waveform ◽  
Delayed Discharge ◽  
Plot Analysis ◽  
Delay Times ◽  
Discharge Behavior ◽  
Delayed Discharges

Delayed discharges due to electrical breakdown are observed in modulated pulsed pow er magnetron sputtering (MPPMS) plasma of titanium. The delayed discharge, which is remarkable with decreasing argon gas pressure, transforms the discharge current waveform from a standard modulated pulsed discharge current waveform to a comb-like discharge current waveform consisting of several pulses with high power. In addition, the delay times, consisting of statistical times and formative times in the delayed MPPMS discharges, are experimentally measured with the help of Laue plot analysis. The pressure dependence of delay times observed indicates that the delayed discharge behavior matches the breakdown characteristics well. In the present study, the delayed discharge dynamics of the comb-like discharge current waveform, which can be the origin of deep oscillation magnetron sputtering, are investigated based on measurement of the delay times and the characteristics of discharge current waveforms.

scholarly journals Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

2018 ◽  
Vol 36 (4) ◽  
pp. 697-703 ◽  
Author(s):  
G.W. Strzelecki ◽  
K. Nowakowska-Langier ◽  
R. Chodun ◽  
S. Okrasa ◽  
B. Wicher ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission Spectroscopy ◽  
Film Growth ◽  
Modulation Frequency ◽  
Optical Emission ◽  
Pulsed Power ◽  
Additional Parameter ◽  
The Impact ◽  
Different Levels ◽  
Pulsed Magnetron

AbstractThe research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering

2013 ◽  
Vol 214 ◽  
pp. 38-45 ◽  
Author(s):  
Sterling Myers ◽  
Jianliang Lin ◽  
Roberto Martins Souza ◽  
William D. Sproul ◽  
John J. Moore
Keyword(s):  
Phase Transition ◽  
Magnetron Sputtering ◽  
Pulsed Power ◽  
Α Phase ◽  
Tantalum Coatings
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