Selective-area growth of GaN nanowires on SiO2-masked Si (111) substrates by molecular beam epitaxy
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
1995 ◽
Vol 156
(1-2)
◽
pp. 1-10
◽
Keyword(s):
Keyword(s):