Small polaron-related recombination in BaxSr1−xTiO3 thin films by cathodoluminescence spectroscopy

2016 ◽  
Vol 108 (10) ◽  
pp. 102901 ◽  
Author(s):  
Adam J. Hauser ◽  
Evgeny Mikheev ◽  
Adam P. Kajdos ◽  
Anderson Janotti
2020 ◽  
Vol 53 (47) ◽  
pp. 475304
Author(s):  
Sruthy Subash ◽  
Vijay Vaiyapuri ◽  
M Navaneethan ◽  
Yuvaraj Sivalingam ◽  
K Kamala Bharathi

1998 ◽  
Vol 83 (11) ◽  
pp. 5913-5916 ◽  
Author(s):  
D. C. Worledge ◽  
L. Miéville ◽  
T. H. Geballe
Keyword(s):  

Vacuum ◽  
1991 ◽  
Vol 42 (16) ◽  
pp. 1091-1092
Author(s):  
Tan Hui ◽  
Tao Mingde ◽  
Gin Dong ◽  
Han Ying

2015 ◽  
Vol 106 (10) ◽  
pp. 102406 ◽  
Author(s):  
Jing Wang ◽  
Feng-xia Hu ◽  
Ying-ying Zhao ◽  
Yao Liu ◽  
Rong-rong Wu ◽  
...  

2017 ◽  
Vol 904 ◽  
pp. 120-124
Author(s):  
Hao Yu Chu ◽  
Yu Xiong Li ◽  
Cheng Yan Gu ◽  
Chun Ping Jiang

In this work, different thick TiN thin films were prepared by pulsed laser deposition on GaN substrates at 650°C. The crystal structure and morphology are characterized by X-ray Diffraction and Atomic Force Microscopy. We characterized the sample by cathodoluminescence spectroscopy at room temperature and measured the thickness of the film by a cross-sectional scanning electron microscopy. Combining the attenuation of light intensity and the thickness, the absorption coefficient of the samples can be estimated by the Beer-Lambert law. The absorption coefficients of TiN metal thin film obtained here are closed with each other. The optical properties may not change with increasing thickness.


2012 ◽  
Vol 24 (7) ◽  
pp. 901-905 ◽  
Author(s):  
Steffen Duhm ◽  
Qian Xin ◽  
Shunsuke Hosoumi ◽  
Hirohiko Fukagawa ◽  
Kazushi Sato ◽  
...  

Author(s):  
Carol Trager-Cowan ◽  
P. G. Middleton ◽  
K. P. O'Donnell

In this paper we compare gallium nitride (GaN) films grown by molecular beam epitaxy on sapphire (Al2O3), gallium arsenide (GaAs (111)B) and lithium gallate (LiGaO2) substrates. Atomic force microscopy, scanning electron microscopy, cathodoluminescence imaging and cathodoluminescence spectroscopy are used to characterise the films. From growth runs carried out to date, GaN films on GaAs substrates exhibit the best surface uniformity and the cleanest luminescence.


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