scholarly journals In-operando hard X-ray photoelectron spectroscopy study on the impact of current compliance and switching cycles on oxygen and carbon defects in resistive switching Ti/HfO2/TiN cells

2014 ◽  
Vol 115 (20) ◽  
pp. 204509 ◽  
Author(s):  
Malgorzata Sowinska ◽  
Thomas Bertaud ◽  
Damian Walczyk ◽  
Sebastian Thiess ◽  
Pauline Calka ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Current Compliance ◽  
In Operando ◽  
The Impact

In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy

2012 ◽  
Vol 101 (14) ◽  
pp. 143501 ◽  
Author(s):  
Thomas Bertaud ◽  
Malgorzata Sowinska ◽  
Damian Walczyk ◽  
Sebastian Thiess ◽  
Andrei Gloskovskii ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Destructive Analysis ◽  
In Operando ◽  
Non Destructive

scholarly journals Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures

2012 ◽  
Vol 100 (23) ◽  
pp. 233509 ◽  
Author(s):  
M. Sowinska ◽  
T. Bertaud ◽  
D. Walczyk ◽  
S. Thiess ◽  
M. A. Schubert ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray

Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study

1997 ◽  
Vol 70 (1) ◽  
pp. 63-65 ◽  
Author(s):  
A. Kamath ◽  
D. L. Kwong ◽  
Y. M. Sun ◽  
P. M. Blass ◽  
S. Whaley ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Low Pressures
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