In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt

2020 ◽  
Vol 38 (2) ◽  
pp. 022611
Author(s):  
Zijian Wang ◽  
Robert L. Opila
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Spectroscopy Study ◽  
X Ray ◽  
In Operando ◽  
Atomic Layer Etching

Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)

2015 ◽  
Vol 120 (1) ◽  
pp. 243-251 ◽  
Author(s):  
Ashley R. Head ◽  
Shilpi Chaudhary ◽  
Giorgia Olivieri ◽  
Fabrice Bournel ◽  
Jesper N. Andersen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
Atomic Layer ◽  
Spectroscopy Study ◽  
X Ray ◽  
Layer Deposition

Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study

1997 ◽  
Vol 70 (1) ◽  
pp. 63-65 ◽  
Author(s):  
A. Kamath ◽  
D. L. Kwong ◽  
Y. M. Sun ◽  
P. M. Blass ◽  
S. Whaley ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Low Pressures

scholarly journals Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy

2017 ◽  
Vol 12 (1) ◽  
Author(s):  
Baojun Yan ◽  
Shulin Liu ◽  
Yuekun Heng ◽  
Yuzhen Yang ◽  
Yang Yu ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Band Offset ◽  
X Ray
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