Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures

M. Sowinska; T. Bertaud; D. Walczyk; S. Thiess; M. A. Schubert; M. Lukosius; W. Drube; Ch. Walczyk; T. Schroeder

doi:10.1063/1.4728118

Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures

Applied Physics Letters ◽

10.1063/1.4728118 ◽

2012 ◽

Vol 100 (23) ◽

pp. 233509 ◽

Cited By ~ 74

Author(s):

M. Sowinska ◽

T. Bertaud ◽

D. Walczyk ◽

S. Thiess ◽

M. A. Schubert ◽

...

Keyword(s):

Resistive Switching ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray

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In-operando hard X-ray photoelectron spectroscopy study on the impact of current compliance and switching cycles on oxygen and carbon defects in resistive switching Ti/HfO2/TiN cells

Journal of Applied Physics ◽

10.1063/1.4879678 ◽

2014 ◽

Vol 115 (20) ◽

pp. 204509 ◽

Cited By ~ 38

Author(s):

Malgorzata Sowinska ◽

Thomas Bertaud ◽

Damian Walczyk ◽

Sebastian Thiess ◽

Pauline Calka ◽

...

Keyword(s):

Resistive Switching ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray ◽

Current Compliance ◽

In Operando ◽

The Impact

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X-Ray Photoelectron Spectroscopy Study of Si-C Film Growth by Chemical Vapor Deposition of Ethylene on Si(100)

10.21236/ada197437 ◽

1988 ◽

Author(s):

P. A. Taylor ◽

M. Bozack ◽

W. J. Choyke ◽

J. T. Yates ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Film Growth ◽

Chemical Vapor ◽

Spectroscopy Study ◽

X Ray

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Time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy study of 2‐phenylimidazole on brass

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.8974 ◽

2020 ◽

Vol 35 (2) ◽

Author(s):

Matjaž Finšgar

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Spectroscopy Study ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A high-resolution X-ray photoelectron spectroscopy study of trifluoroacetic anhydride labelling of hydroxyl groups: demonstration of the β shift due to OC(O)CF3

Polymer ◽

10.1016/0032-3861(93)90418-a ◽

1993 ◽

Vol 34 (9) ◽

pp. 1795-1799 ◽

Cited By ~ 35

Author(s):

A.P. Ameen ◽

R.J. Ward ◽

R.D. Short ◽

G. Beamson ◽

D. Briggs

Keyword(s):

High Resolution ◽

Photoelectron Spectroscopy ◽

Trifluoroacetic Anhydride ◽

Hydroxyl Groups ◽

Spectroscopy Study ◽

X Ray

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Cited By ~ 5

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

X Ray

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Combined Time-of-Flight Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy Study of the Surface Segregation of Poly(methyl methacrylate) (PMMA) in Bisphenol A Polycarbonate/PMMA Blends

Macromolecules ◽

10.1021/ma00117a038 ◽

1995 ◽

Vol 28 (13) ◽

pp. 4631-4637 ◽

Cited By ~ 52

Author(s):

J.-B. Lhoest ◽

P. Bertrand ◽

L. T. Weng ◽

J.-L. Dewez

Keyword(s):

Mass Spectrometry ◽

Bisphenol A ◽

Photoelectron Spectroscopy ◽

Surface Segregation ◽

Secondary Ion Mass Spectrometry ◽

Spectroscopy Study ◽

Bisphenol A Polycarbonate ◽

X Ray ◽

Secondary Ion ◽

Pmma Blends

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X-ray photoelectron spectroscopy study of thiols adsorbed on Pt(111) with and without the presence of a copper monolayer

Surface and Interface Analysis ◽

10.1002/1096-9918(200008)30:1<359::aid-sia819>3.0.co;2-j ◽

2000 ◽

Vol 30 (1) ◽

pp. 359-363 ◽

Cited By ~ 5

Author(s):

C. Alonso ◽

M. F. L�pez ◽

A. Guti�rrez ◽

M. L. Escudero

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray

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Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study

Applied Physics Letters ◽

10.1063/1.119307 ◽

1997 ◽

Vol 70 (1) ◽

pp. 63-65 ◽

Cited By ~ 44

Author(s):

A. Kamath ◽

D. L. Kwong ◽

Y. M. Sun ◽

P. M. Blass ◽

S. Whaley ◽

...

Keyword(s):

Nitric Oxide ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray ◽

Low Pressures

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A transmission electron microscopy and X-ray photoelectron spectroscopy study of annealing induced γ-phase nucleation, clustering, and interfacial dynamics in reactively sputtered amorphous alumina thin films

Journal of Applied Physics ◽

10.1063/1.4916331 ◽

2015 ◽

Vol 117 (12) ◽

pp. 125307 ◽

Cited By ~ 11

Author(s):

A. K. Nanda Kumar ◽

S. Prasanna ◽

B. Subramanian ◽

S. Jayakumar ◽

G. Mohan Rao

Keyword(s):

Electron Microscopy ◽

Thin Films ◽

Transmission Electron Microscopy ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

Interfacial Dynamics ◽

X Ray ◽

Transmission Electron ◽

Phase Nucleation ◽

Amorphous Alumina

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X-ray photoelectron spectroscopy study of GaAs(110) cleaved in alcoholic sulfide solutions

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589501 ◽

1997 ◽

Vol 15 (4) ◽

pp. 876 ◽

Cited By ~ 1

Author(s):

Vasily N. Bessolov

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray

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