Electrical and optical characterization of Pd/ZnO nanorods (NRs) Schottky diodes grown on n-Si substrates

Author(s):  
Divya Somvanshi ◽  
S. Jit
1989 ◽  
Vol 55 (4) ◽  
pp. 365-367 ◽  
Author(s):  
J. De Boeck ◽  
K. Deneffe ◽  
J. Christen ◽  
D. J. Arent ◽  
G. Borghs

2013 ◽  
Vol 4 ◽  
pp. 726-731 ◽  
Author(s):  
Gema López ◽  
Pablo R Ortega ◽  
Cristóbal Voz ◽  
Isidro Martín ◽  
Mónica Colina ◽  
...  

The aim of this work is to study the surface passivation of aluminum oxide/amorphous silicon carbide (Al2O3/a-SiCx) stacks on both p-type and n-type crystalline silicon (c-Si) substrates as well as the optical characterization of these stacks. Al2O3 films of different thicknesses were deposited by thermal atomic layer deposition (ALD) at 200 °C and were complemented with a layer of a-SiCx deposited by plasma-enhanced chemical vapor deposition (PECVD) to form anti-reflection coating (ARC) stacks with a total thickness of 75 nm. A comparative study has been carried out on polished and randomly textured wafers. We have experimentally determined the optimum thickness of the stack for photovoltaic applications by minimizing the reflection losses over a wide wavelength range (300–1200 nm) without compromising the outstanding passivation properties of the Al2O3 films. The upper limit of the surface recombination velocity (S eff,max) was evaluated at a carrier injection level corresponding to 1-sun illumination, which led to values below 10 cm/s. Reflectance values below 2% were measured on textured samples over the wavelength range of 450–1000 nm.


2012 ◽  
Vol 134 (2-3) ◽  
pp. 821-828 ◽  
Author(s):  
E. Zielony ◽  
E. Płaczek-Popko ◽  
P. Nowakowski ◽  
Z. Gumienny ◽  
A. Suchocki ◽  
...  

2013 ◽  
Vol 114 (18) ◽  
pp. 183508 ◽  
Author(s):  
B. P. Falcão ◽  
J. P. Leitão ◽  
M. R. Correia ◽  
M. R. Soares ◽  
F. M. Morales ◽  
...  

2013 ◽  
Vol 48 (16) ◽  
pp. 5536-5542 ◽  
Author(s):  
H. S. Bhatti ◽  
Sunil Kumar ◽  
Karamjit Singh ◽  
Kavita

2016 ◽  
Vol 130 (5) ◽  
pp. 1199-1201
Author(s):  
B.S. Witkowski ◽  
V.Y. Ivanov ◽  
Ł. Wachnicki ◽  
S. Gierałtowska ◽  
M. Godlewski

2007 ◽  
Author(s):  
A. G. Taboada ◽  
F. Suárez ◽  
D. Granados ◽  
T. J. Badcock ◽  
D. J. Mowbray ◽  
...  

2010 ◽  
Vol 45 (9) ◽  
pp. 988-992 ◽  
Author(s):  
Jie Wang ◽  
Huizhao Zhuang ◽  
Junlin Li ◽  
Peng Xu
Keyword(s):  

2011 ◽  
Vol 3 (4) ◽  
pp. 468-471
Author(s):  
Walter Water ◽  
Te-Hua Fang ◽  
Yu-Jen Hsiao ◽  
Liang-Wen Ji ◽  
Ju-Hsuan Tsai ◽  
...  

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