Photoelectron spectroscopy of boron aluminum hydride cluster anions

2014 ◽  
Vol 140 (16) ◽  
pp. 164317 ◽  
Author(s):  
Haopeng Wang ◽  
Xinxing Zhang ◽  
Yeon Jae Ko ◽  
Gerd Gantefoer ◽  
Kit H. Bowen ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Aluminum Hydride ◽  
Cluster Anions

Photoelectron spectroscopy of mixed metal cluster anions: NiCu−, NiAg−, NiAg−2, and Ni2Ag−

1996 ◽  
Vol 104 (13) ◽  
pp. 4902-4910 ◽  
Author(s):  
St. J. Dixon‐Warren ◽  
R. F. Gunion ◽  
W. C. Lineberger
Keyword(s):  
Photoelectron Spectroscopy ◽  
Metal Cluster ◽  
Cluster Anions ◽  
Mixed Metal ◽  
Mixed Metal Cluster

Photoelectron spectroscopy of chromium-doped silicon cluster anions

2005 ◽  
Vol 122 (7) ◽  
pp. 071101 ◽  
Author(s):  
Weijun Zheng ◽  
J. Michael Nilles ◽  
Dunja Radisic ◽  
Kit H. Bowen
Keyword(s):  
Photoelectron Spectroscopy ◽  
Silicon Cluster ◽  
Cluster Anions ◽  
Doped Silicon

scholarly journals Photoelectron spectroscopy of jet-cooled aluminium cluster anions

1988 ◽  
Vol 9 (3) ◽  
pp. 253-261 ◽  
Author(s):  
G. Gantef�r ◽  
M. Gausa ◽  
K. H. Meiwes-Broer ◽  
H. O. Lutz
Keyword(s):  
Photoelectron Spectroscopy ◽  
Cluster Anions

Formation and Photoelectron Spectroscopy of Nanoscale Cluster Anions of Biphenyl, (BP)n−(n= 2–100)

2005 ◽  
Vol 34 (9) ◽  
pp. 1244-1245 ◽  
Author(s):  
Masaaki Mitsui ◽  
Yukino Matsumoto ◽  
Naoto Ando ◽  
Atsushi Nakajima
Keyword(s):  
Photoelectron Spectroscopy ◽  
Cluster Anions

Photoelectron spectroscopy of hydrated electron cluster anions, (H2O)−n=2–69

1990 ◽  
Vol 92 (6) ◽  
pp. 3980-3982 ◽  
Author(s):  
J. V. Coe ◽  
G. H. Lee ◽  
J. G. Eaton ◽  
S. T. Arnold ◽  
H. W. Sarkas ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Hydrated Electron ◽  
Cluster Anions ◽  
Electron Cluster

Photoelectron spectroscopy of transition metal-sulfur cluster anions

1997 ◽  
Vol 40 (1) ◽  
pp. 17 ◽  
Author(s):  
Atsushi Nakajima ◽  
Hiroshi Kawamata ◽  
Takasuke Hayase ◽  
Yuichi Negishi ◽  
Koji Kaya
Keyword(s):  
Transition Metal ◽  
Photoelectron Spectroscopy ◽  
Cluster Anions ◽  
Sulfur Cluster

Low Pressure CVD Growth of AlxTi1-xN Films with Tetrakis- (Dimethylamido)Titanium (Tdmat) and Dimethyl Aluminum Hydride (DMAH) Precursors

1997 ◽  
Vol 495 ◽  
Author(s):  
Y.-M. Sun ◽  
J. Endle ◽  
J. G. Ekerdt ◽  
N. M. Russell ◽  
M. D. Healy ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Aluminum Hydride ◽  
Chemical Vapor ◽  
Initial Growth ◽  
Lower Growth ◽  
Al Content ◽  
Partial Pressures ◽  
Cvd Growth ◽  
C And N

ABSTRACTAlxTi1-xN film growth has been studied by a organometallic chemical vapor deposition and in-situ X-ray photoelectron spectroscopy. Terakis(dimethylamido)titanium (TDMAT) and dimethyl aluminum hydride (DMAH) were used as the Ti, N and Al precursors. AlTiN film growth was observed on SiO2/Si(100) with substrate temperatures between 200 and 400 °C. The Al content in the film is controlled by the ratio of partial pressures of the two precursors in the gas phase. The metal to C to N ratio is approximately constant at 1:1:1 for most conditions studied. The chemical states of Ti, C, and N in AlxTi1-xN and titanium-carbo-nitride (TiCN) films are identical, while the Al chemical state is nitride at low, but increasingly carbidic at high Al concentration. The initial growth rate on SiO2 was significantly suppressed by the presence of DMAH. At lower growth temperatures, the DMAH effect is more severe. Good step coverage was observed for AlxTi1-xN on 0.3 μm vias with a 3:1 aspect ratio.

Photoelectron spectroscopy of palladium-doped gold cluster anions; Au Pd− (n=1–4)

2002 ◽  
Vol 358 (3-4) ◽  
pp. 224-230 ◽  
Author(s):  
Kiichirou Koyasu ◽  
Masaaki Mitsui ◽  
Atsushi Nakajima ◽  
Koji Kaya
Keyword(s):  
Photoelectron Spectroscopy ◽  
Gold Cluster ◽  
Cluster Anions
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