scholarly journals Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching

AIP Advances ◽  
2014 ◽  
Vol 4 (3) ◽  
pp. 031335 ◽  
Author(s):  
Xinshuai Zhang ◽  
Jing Liu ◽  
Bo Wang ◽  
Tianchong Zhang ◽  
Futing Yi
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Cesium Chloride ◽  
Dry Etching ◽  
Silicon Nanotip

Cooperative Self-Assembly of Pyridine-2,6-Diimine-Linked Macrocycles into Mechanically Robust Nanotubes

2019 ◽  
Author(s):  
Michael J. Strauss ◽  
Darya Asheghali ◽  
Austin Evans ◽  
Rebecca Li ◽  
Anton Chavez ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Gel Permeation Chromatography ◽  
Synthetic Polymers ◽  
Young’S Moduli ◽  
Structural Rigidity ◽  
Assembly Mechanism ◽  
Low Dimensionality ◽  
Harsh Conditions

<p>Nanotubes assembled from macrocyclic precursors offer a unique combination of low dimensionality, structural rigidity, and distinct interior and exterior microenvironments. Usually the weak stacking energies of macrocycles limit the length or strength of the resultant nanotubes. Imine-linked macrocycles were recently found to assemble into high-aspect ratio (>10<sup>3</sup>), lyotropic nanotubes in the presence of excess acid. Yet these harsh conditions are incompatible with many functional groups and processing methods, and lower acid loadings instead catalyze macrocycle degradation. Here we report pyridine-2,6-diimine-linked macrocycles that assemble into high-aspect ratio nanotubes in the presence of less than 1 equiv of CF<sub>3</sub>CO<sub>2</sub>H per macrocycle. Analysis by gel permeation chromatography and fluorescence spectroscopy revealed a cooperative self-assembly mechanism. Nanofibers obtained by touch-spinning the pyridinium-based nanotubes exhibit Young’s moduli of 1.48 GPa, which exceeds that of many synthetic polymers and biological filaments. These findings will enable the design of structurally diverse nanotubes from synthetically accessible macrocycles. </p>

Photopolymerization-assisted self-assembly as a strategy to obtain a dispersion of very high aspect ratio nanostructures in a polystyrene matrix

2019 ◽  
Vol 112 ◽  
pp. 704-713 ◽  
Author(s):  
Ú.M. Montoya Rojo ◽  
C.C. Riccardi ◽  
M.D. Ninago ◽  
A.E. Ciolino ◽  
M.A. Villar ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Polystyrene Matrix ◽  
Very High

scholarly journals High-aspect-ratio mushroom-like silica nanopillars immersed in air: epsilon-near-zero metamaterials mediated by a phonon-polaritonic anisotropy

RSC Advances ◽  
2019 ◽  
Vol 9 (29) ◽  
pp. 16431-16438
Author(s):  
Kota Ito ◽  
Yuri Yamada ◽  
Atsushi Miura ◽  
Hideo Iizuka
Keyword(s):  
Block Copolymers ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Infrared Range ◽  
Mid Infrared ◽  
Zero Response ◽  
Epsilon Near Zero

High-aspect-ratio mushroom-like silica nanopillars fabricated from self-assembly of block-copolymers exhibit a uniaxial epsilon-near-zero response in the mid-infrared range.

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

2017 ◽  
Vol 180 ◽  
pp. 20-24 ◽  
Author(s):  
Y. Lisunova ◽  
M. Spieser ◽  
R.D.D. Juttin ◽  
F. Holzner ◽  
J. Brugger
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Scanning Probe ◽  
Scanning Probe Lithography

The performances of silicon solar cell with core–shell p-n junctions of micro-nano pillars fabricated by cesium chloride self-assembly and dry etching

2013 ◽  
Vol 114 (4) ◽  
pp. 1175-1179 ◽  
Author(s):  
Jing Liu ◽  
Xinshuai Zhang ◽  
Gangqiang Dong ◽  
Yuanxun Liao ◽  
Bo Wang ◽  
...  
Keyword(s):  
Solar Cell ◽  
Self Assembly ◽  
Silicon Solar Cell ◽  
Cesium Chloride ◽  
Dry Etching ◽  
Core Shell

Multiform structures with silicon nanopillars by cesium chloride self-assembly and dry etching

2011 ◽  
Vol 257 (24) ◽  
pp. 10489-10493 ◽  
Author(s):  
Yuan-xun Liao ◽  
Jing Liu ◽  
Bo Wang ◽  
Fu-ting Yi
Keyword(s):  
Self Assembly ◽  
Cesium Chloride ◽  
Dry Etching
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