scholarly journals High-frequency characterization of thermionic charge transport in silicon-on-insulator nanowire transistors

2014 ◽  
Vol 104 (4) ◽  
pp. 043106 ◽  
Author(s):  
A. C. Betz ◽  
S. Barraud ◽  
Q. Wilmart ◽  
B. Plaçais ◽  
X. Jehl ◽  
...  
2000 ◽  
Vol 21 (10) ◽  
pp. 497-499 ◽  
Author(s):  
C.L. Chen ◽  
R.H. Mathews ◽  
J.A. Burns ◽  
P.W. Wyatt ◽  
D.-R. Yost ◽  
...  

2001 ◽  
Vol 11 (04) ◽  
pp. 1159-1248 ◽  
Author(s):  
D. FLANDRE ◽  
J.-P. RASKIN ◽  
D. VANHOENACKER-JANVIER

The new communication markets are vey demanding: high frequency, high degree of integration, low power consumption. Silicon-on-Insulator offers many advantages and this paper illustrates the potentialities of this technology for RF and microwave applictions. After an overview of the SOI material, the properties of the SOI MOSFET's are analyzed and compared to bulk Si MOSFET's. The models of transmission lines and inductors on SOI are compared and further used in the on-wafer characterization of the transistors. Various models for the transistors are presented and their limitations are given. A new model is described, valid from DC to the microwave region. This model agrees very well with the measurements for various transistor dimensions. Finally, variuos RF and microware circuits are presented. Ths paper does not fully describe all the properties and applications of SOI but the numerous references offered to the reader help him to gather more informations.


2021 ◽  
Vol 14 (1) ◽  
pp. 1-10
Author(s):  
JIANG Yi-yang ◽  
◽  
CHEN Yan ◽  
WANG Xu-dong ◽  
ZHAO Dong-yang ◽  
...  
Keyword(s):  

2010 ◽  
Vol 31 (3) ◽  
pp. 353-359
Author(s):  
Xiaoyan CHAI ◽  
Shuyong SHANG ◽  
Gaihuan LIU ◽  
Xumei TAO ◽  
Xiang LI ◽  
...  

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