Thermal conductivity of ultra-thin chemical vapor deposited hexagonal boron nitride films

2014 ◽  
Vol 104 (1) ◽  
pp. 013113 ◽  
Author(s):  
M. T. Alam ◽  
M. S. Bresnehan ◽  
J. A. Robinson ◽  
M. A. Haque
Keyword(s):  
Thermal Conductivity ◽  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited ◽  
Boron Nitride Films

scholarly journals Grain boundaries in chemical-vapor-deposited atomically thin hexagonal boron nitride

2019 ◽  
Vol 3 (1) ◽  
Author(s):  
Xibiao Ren ◽  
Jichen Dong ◽  
Peng Yang ◽  
Jidong Li ◽  
Guangyuan Lu ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Grain Boundaries ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

scholarly journals Dielectric Breakdown in Chemical Vapor Deposited Hexagonal Boron Nitride

2017 ◽  
Vol 9 (45) ◽  
pp. 39758-39770 ◽  
Author(s):  
Lanlan Jiang ◽  
Yuanyuan Shi ◽  
Fei Hui ◽  
Kechao Tang ◽  
Qian Wu ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Dielectric Breakdown ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

Surface conditioning of chemical vapor deposited hexagonal boron nitride film for negative electron affinity

1999 ◽  
Vol 74 (1) ◽  
pp. 28-30 ◽  
Author(s):  
Kian Ping Loh ◽  
Isao Sakaguchi ◽  
Mikka Nishitani Gamo ◽  
Shigeru Tagawa ◽  
Takashi Sugino ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Electron Affinity ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Nitride Film ◽  
Negative Electron Affinity ◽  
Surface Conditioning ◽  
Chemical Vapor Deposited

Chemical Vapor Deposition and Etching of High-Quality Monolayer Hexagonal Boron Nitride Films

ACS Nano ◽  
2011 ◽  
Vol 5 (9) ◽  
pp. 7303-7309 ◽  
Author(s):  
Peter Sutter ◽  
Jayeeta Lahiri ◽  
Peter Albrecht ◽  
Eli Sutter
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
High Quality ◽  
Boron Nitride Films

scholarly journals Electrical Homogeneity of Large-Area Chemical Vapor Deposited Multilayer Hexagonal Boron Nitride Sheets

2017 ◽  
Vol 9 (46) ◽  
pp. 39895-39900 ◽  
Author(s):  
Fei Hui ◽  
Wenjing Fang ◽  
Wei Sun Leong ◽  
Tewa Kpulun ◽  
Haozhe Wang ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Large Area ◽  
Chemical Vapor Deposited

Epitaxially Grown Hexagonal Boron Nitride Films on Sapphire and Silicon Substrates

2020 ◽  
Vol 843 ◽  
pp. 90-96
Author(s):  
Xi Chen ◽  
Chun Bo Tan ◽  
Kai Ran Luan ◽  
Shuai Wang ◽  
Fang Ye Li ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
Pressure Chemical ◽  
Boron Source ◽  
Α Al2o3 ◽  
Boron Nitride Films

Hexagonal boron nitride (hBN) films were epitaxially grown on (100)-Oriented silicon and c-plane sapphire (α-Al2O3) substrates via a low-pressure chemical vapor deposition (LPCVD) method with boron trichloride (BCl3) and ammonia (NH3) as the boron source and nitrogen source. Crystalline quality differences between hBN films grown on different substrates are studied and discussed by XPS, Raman spectroscopy, XRD and SEM characterizations. All the characterization results indicate that the sapphire substrate is more suitable for epitaxial growth of hBN films than silicon substrates.

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