InGaAsBi alloys on InP for efficient near- and mid-infrared light emitting devices

2013 ◽  
Vol 114 (21) ◽  
pp. 213103 ◽  
Author(s):  
Shirong Jin ◽  
Stephen John Sweeney
2000 ◽  
Vol 15 (1) ◽  
pp. 44-50 ◽  
Author(s):  
H Page ◽  
C Sirtori ◽  
S Barbieri ◽  
P Kruck ◽  
M Stellmacher ◽  
...  

AIP Advances ◽  
2014 ◽  
Vol 4 (8) ◽  
pp. 087139 ◽  
Author(s):  
L. M. Lawton ◽  
N. H. Mahlmeister ◽  
I. J. Luxmoore ◽  
G. R. Nash

1998 ◽  
Vol 72 (12) ◽  
pp. 1495-1497 ◽  
Author(s):  
E. Dupont ◽  
J. P. McCaffrey ◽  
H. C. Liu ◽  
M. Buchanan ◽  
Rui Q. Yang ◽  
...  

1998 ◽  
Vol 535 ◽  
Author(s):  
M. Yoshimoto ◽  
J. Saraie ◽  
T. Yasui ◽  
S. HA ◽  
H. Matsunami

AbstractGaAs1–xPx (0.2 <; x < 0.7) was grown by metalorganic molecular beam epitaxy with a GaP buffer layer on Si for visible light-emitting devices. Insertion of the GaP buffer layer resulted in bright photoluminescence of the GaAsP epilayer. Pre-treatment of the Si substrate to avoid SiC formation was also critical to obtain good crystallinity of GaAsP. Dislocation formation, microstructure and photoluminescence in GaAsP grown layer are described. A GaAsP pn junction fabricated on GaP emitted visible light (˜1.86 eV). An initial GaAsP pn diode fabricated on Si emitted infrared light.


2013 ◽  
Vol 103 (18) ◽  
pp. 183513 ◽  
Author(s):  
Parthiban Santhanam ◽  
Duanni Huang ◽  
Rajeev J. Ram ◽  
Maxim A. Remennyi ◽  
Boris A. Matveev

Nanoscale ◽  
2020 ◽  
Vol 12 (22) ◽  
pp. 11784-11807 ◽  
Author(s):  
Changyong Lan ◽  
Zhe Shi ◽  
Rui Cao ◽  
Chun Li ◽  
Han Zhang

A study of typical 2D materials beyond graphene suitable for infrared applications, in particular, infrared light emitting devices, optical modulators, and photodetectors.


2000 ◽  
Author(s):  
Mark J. Pullin ◽  
Xiaobing Li ◽  
Joerg Heber ◽  
David Gervaux ◽  
Christopher C. Phillips

2007 ◽  
Author(s):  
V. M. Smirnov ◽  
P. J. Batty ◽  
A. Krier ◽  
R. Jones ◽  
V. I. Vasil'ev ◽  
...  

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