Demonstrating 1 nm-oxide-equivalent-thickness HfO2/InSb structure with unpinning Fermi level and low gate leakage current density

2013 ◽  
Vol 103 (14) ◽  
pp. 142903 ◽  
Author(s):  
Hai-Dang Trinh ◽  
Yueh-Chin Lin ◽  
Minh-Thuy Nguyen ◽  
Hong-Quan Nguyen ◽  
Quoc-Van Duong ◽  
...  
Keyword(s):  
Fermi Level ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Gate Leakage Current ◽  
Gate Leakage ◽  
Equivalent Thickness ◽  
Gate Leakage Current Density

scholarly journals AlGaN/GaN MIS-HEMT with PECVD SiNx, SiON, SiO2 as Gate Dielectric and Passivation Layer

Electronics ◽  
2018 ◽  
Vol 7 (12) ◽  
pp. 416 ◽  
Author(s):  
Kuiwei Geng ◽  
Ditao Chen ◽  
Quanbin Zhou ◽  
Hong Wang
Keyword(s):  
Leakage Current ◽  
Gate Dielectric ◽  
Deep Trap ◽  
Trap Density ◽  
Interface Traps ◽  
Gate Leakage Current ◽  
Gate Leakage ◽  
Metal Insulator ◽  
Current Collapse ◽  
Gate Leakage Current Density

Three different insulator layers SiNx, SiON, and SiO2 were used as a gate dielectric and passivation layer in AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMT). The SiNx, SiON, and SiO2 were deposited by a plasma-enhanced chemical vapor deposition (PECVD) system. Great differences in the gate leakage current, breakdown voltage, interface traps, and current collapse were observed. The SiON MIS-HEMT exhibited the highest breakdown voltage and Ion/Ioff ratio. The SiNx MIS-HEMT performed well in current collapse but exhibited the highest gate leakage current density. The SiO2 MIS-HEMT possessed the lowest gate leakage current density but suffered from the early breakdown of the metal–insulator–semiconductor (MIS) diode. As for interface traps, the SiNx MIS-HEMT has the largest shallow trap density and the lowest deep trap density. The SiO2 MIS-HEMT has the largest deep trap density. The factors causing current collapse were confirmed by Photoluminescence (PL) spectra. Based on the direct current (DC) characteristics, SiNx and SiON both have advantages and disadvantages.

A Study on the Improvement of Characteristics of BST Thin Films Fabricated on Iridium Electrode

1997 ◽  
Vol 493 ◽  
Author(s):  
Deok-Sin Kil ◽  
Byung-Il Lee ◽  
Seung-Ki Joo
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Bottom Layer ◽  
Equivalent Thickness ◽  
Bst Thin Films ◽  
Low Leakage ◽  
Low Leakage Current

ABSTRACTBST thin films have been fabricated by RF magnetron sputtering onto Ir layer as a bottom electrode. When the substrate temperature was maintained at 600 °C during deposition, BST films deposited at that temperature showed very small oxide equivalent thickness of 0.36nm as well as very low leakage current density of about 10−8A/cm2at 1.5V. But as substrate temperature was increased to 700 °C in order to obtain high dielectric constant, oxide equivalent thickness exhibited very low value of about 0.3nm, however, leakage current density drastically increased to 10−4/cm2. BST thin films were fabricated by two step process, which consists of bottom layer deposited at high substrate temperature of 700 °C and top layer deposited at low substrate temperature. In the case of BST thin films which are composed of 20nm thick bottom layer deposited at 700 °C and 30nm thick top layer deposited at 500 °C, we obtained very small oxide equivalent thickness of 0.31nm and low leakage current density of 4 × 10−8A/cm2. at 1.5V.

Low Temperature Preparation of High-Quality Pb(Zr,Ti)O3 Films by Metal Organic Chemical Vapor Deposition with High Reproducibility

2001 ◽  
Vol 688 ◽  
Author(s):  
Hiroshi Funakubo ◽  
Kuniharu Nagashima ◽  
Masanori Aratani ◽  
Kouji Tokita ◽  
Takahiro Oikawa ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Vapor Deposition ◽  
Deposition Temperature ◽  
Chemical Vapor ◽  
Process Window ◽  
High Quality ◽  
Low Temperature Preparation

AbstractPb(Zr,Ti)O3 (PZT) is one of the most promising materials for ferroelectric random access memory (FeRAM) application. Among the various preparation methods, metalorganic chemical vapor deposition (MOCVD) has been recognized as a most important one to realize high density FeRAM because of its potential of high-step-coverage and large-area-uniformity of the film quality.In the present study, pulsed-MOCVD was developed in which a mixture of the source gases was pulsed introduced into reaction chamber with interval. By using this deposition technique, simultaneous improvements of the crystallinity, surface smoothness, and electrical property of the film have been reached by comparing to the conventional continuous gas-supplied MOCVD. Moreover, this film had larger remanent polarization (Pr) and lower leakage current density. This is owing to reevaporation of excess Pb element from the film and increase of migration on the surface of substrate during the interval time.This process is also very effective to decrease the deposition temperature of the film having high quality. In fact, the Pr and the leakage current density of polycrystalline Pb(Zr0.35Ti0.65)O3 film deposited at 415 °C were 41.4 μC/cm2 and on the order of 10−7 A/cm2 at 200 kV/cm. This Pr value was almost the same as that of the epitaxially grown film deposited at 415 °C with the same composition corrected for the orientation difference. This suggests that the polycrystalline PZT film prepared by pulsed-MOCVD had the epitaxial-grade ferroelectric properties even through the deposition temperature was as low as 415 °C. Moreover, large “process window” comparable to the process window at 580 °C, above 150 °C higher temperature and was widely used condition, was achieved even at 395°C by the optimization of the deposition condition.

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