scholarly journals Publisher's Note: “Nucleation rate reduction through stress relief of thermally annealed hydrogenated amorphous silicon films” [J. Appl. Phys. 113, 173509 (2013)]

2013 ◽  
Vol 114 (1) ◽  
pp. 019902
Author(s):  
M. S. Dabney ◽  
M. F. A. M. van Hest ◽  
A. H. Mahan ◽  
D. S. Ginley
Keyword(s):  
Amorphous Silicon ◽  
Nucleation Rate ◽  
Hydrogenated Amorphous Silicon ◽  
Stress Relief ◽  
Silicon Films ◽  
Rate Reduction ◽  
Hydrogenated Amorphous

Photoconductivity and trapping parameters in hydrogenated amorphous silicon films

1983 ◽  
Vol 9 (1-3) ◽  
pp. 295-300
Author(s):  
S. Galassini ◽  
G. Micocci ◽  
C. Pennetta ◽  
A. Rizzo ◽  
A. Tepore ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Hydrogenated Amorphous

Substrate temperature effect on the stability of hydrogenated amorphous silicon films deposited at high rates

1995 ◽  
Vol 78 (1) ◽  
pp. 317-320 ◽  
Author(s):  
J. P. Kleider ◽  
C. Longeaud ◽  
M. Barranco‐Diaz ◽  
P. Morin ◽  
P. Roca i Cabarrocas
Keyword(s):  
Substrate Temperature ◽  
Temperature Effect ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
The Stability ◽  
Hydrogenated Amorphous

Interaction of hydrogenated amorphous silicon films with transparent conductive films

1983 ◽  
Vol 54 (6) ◽  
pp. 3269-3271 ◽  
Author(s):  
M. Kitagawa ◽  
K. Mori ◽  
S. Ishihara ◽  
M. Ohno ◽  
T. Hirao ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Transparent Conductive Films ◽  
Conductive Films ◽  
Hydrogenated Amorphous
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