The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry

1999 ◽  
Vol 111 (20) ◽  
pp. 9125-9128 ◽  
Author(s):  
Theresa A. Newton ◽  
Yi-Chiau Huang ◽  
Lori A. Lepak ◽  
Melissa A. Hines
2002 ◽  
Vol 106 (33) ◽  
pp. 8258-8264 ◽  
Author(s):  
Simon P. Garcia ◽  
Hailing Bao ◽  
Muthiah Manimaran ◽  
Melissa A. Hines

2010 ◽  
Vol 50 (4) ◽  
pp. 449-452 ◽  
Author(s):  
U. Burghaus ◽  
A. Zak ◽  
R. Rosentsveig

2015 ◽  
Vol 10 (1) ◽  
pp. 122-128 ◽  
Author(s):  
Josue Baeza ◽  
Michael J. Smallegan ◽  
John M. Denu

1994 ◽  
Vol 86 (s30) ◽  
pp. 11P-11P ◽  
Author(s):  
JE Smithson ◽  
C Prince ◽  
R Pigott ◽  
DP Jewell

2016 ◽  
Vol 120 (50) ◽  
pp. 9968-9981 ◽  
Author(s):  
Max R. McGillen ◽  
Geoffrey S. Tyndall ◽  
John J. Orlando ◽  
Andre S. Pimentel ◽  
Diogo J. Medeiros ◽  
...  

2000 ◽  
Vol 07 (05n06) ◽  
pp. 625-629 ◽  
Author(s):  
L. LI

In this article, we summarize our studies of the surface chemistry of gallium arsenide as it pertains to the metal organic chemical vapor deposition of compound semiconductors. It has been found by scanning tunneling microscopy and vibrational spectroscopy that the adsorption of reactant molecules on reconstruted GaAs (001) surfaces is "site-specific." The adsorption sites on the semiconductor surface are revealed by the vibrational spectrum of adsorbed hydrogen. Studies of arsine adsorption have shown that it dissociatively adsorbs only on gallium sites and transfers hydrogen to the neighboring As atom. Studies of carbon doping with carbon tetrachloride have shown that adsorbed chlorine attacks the exposed gallium and generates volatile GaCl x species. The site-specific nature of this reaction leads to a dramatic change in the film morphology, with the formation of etch pits primarily distributed along the step edges.


ChemCatChem ◽  
2018 ◽  
Vol 10 (2) ◽  
pp. 335-335
Author(s):  
Anita Godiksen ◽  
Oliver L. Isaksen ◽  
Søren B. Rasmussen ◽  
Peter N. R. Vennestrøm ◽  
Susanne Mossin

ChemPhysChem ◽  
2017 ◽  
Vol 18 (4) ◽  
pp. 357-365 ◽  
Author(s):  
Josua Pecher ◽  
Gerson Mette ◽  
Michael Dürr ◽  
Ralf Tonner

ChemCatChem ◽  
2017 ◽  
Vol 10 (2) ◽  
pp. 366-370 ◽  
Author(s):  
Anita Godiksen ◽  
Oliver L. Isaksen ◽  
Søren B. Rasmussen ◽  
Peter N. R. Vennestrøm ◽  
Susanne Mossin

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