Novel materials by atomic layer deposition and molecular layer deposition

MRS Bulletin ◽  
2011 ◽  
Vol 36 (11) ◽  
pp. 877-884 ◽  
Author(s):  
Markku Leskelä ◽  
Mikko Ritala ◽  
Ola Nilsen
Keyword(s):  
Atomic Layer Deposition ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Molecular Layer Deposition ◽  
Novel Materials ◽  
Layer Deposition ◽  
Image Position

Abstract

scholarly journals Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation

RSC Advances ◽  
2019 ◽  
Vol 9 (36) ◽  
pp. 20884-20891 ◽  
Author(s):  
Guixiong Chen ◽  
Yalian Weng ◽  
Fan Sun ◽  
Xiongtu Zhou ◽  
Chaoxing Wu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Barrier Properties ◽  
Organic Light Emitting Diodes ◽  
Molecular Layer Deposition ◽  
Light Emitting ◽  
Organic Light ◽  
Layer Deposition

Al2O3/alucone laminates were fabricated by atomic layer deposition (ALD) and molecular layer deposition (MLD), showing good barrier properties. These laminates were found to prolong the lifetime of organic light-emitting diodes (OLEDs) evidently.

Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition

2021 ◽  
Author(s):  
Seunghwan Lee ◽  
GeonHo Baek ◽  
Hye-mi Kim ◽  
Yong-Hwan Kim ◽  
Jin-Seong Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Amorphous Structures

Metalcone films can be rearranged from amorphous structures to 2D-like carbon by electron beam irradiation. The irradiated indicone (HQ) film can be used as an inhibitor for selective deposition delaying 20 cycles of ALD of ZnO.

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