Controllability of femtosecond laser-induced impulse in water evaluated by local force measurement system using atomic force microscopy

2012 ◽  
Vol 112 (6) ◽  
pp. 066106 ◽  
Author(s):  
Takanori Iino ◽  
Yoichiroh Hosokawa
Keyword(s):  
Atomic Force Microscopy ◽  
Femtosecond Laser ◽  
Measurement System ◽  
Force Measurement ◽  
Force Microscopy ◽  
Atomic Force ◽  
Force Measurement System

Effect of Tip Size on Force Measurement in Atomic Force Microscopy

Langmuir ◽  
2008 ◽  
Vol 24 (6) ◽  
pp. 2271-2273 ◽  
Author(s):  
Leonard T. W. Lim ◽  
Andrew T. S. Wee ◽  
Sean J. O'Shea
Keyword(s):  
Atomic Force Microscopy ◽  
Force Measurement ◽  
Force Microscopy ◽  
Atomic Force

The Study on the Ultrasonic Nanomachining of Au/Ti Thin Film by Atomic Force Microscopy

2014 ◽  
Vol 627 ◽  
pp. 35-39
Author(s):  
Jen Ching Huang ◽  
Ho Chang ◽  
Yong Chin You ◽  
Hui Ti Ling
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Quartz Crystal ◽  
Normal Force ◽  
Force Measurement ◽  
Great Influence ◽  
Measurement Model ◽  
Cutting Depth ◽  
Force Microscopy ◽  
Atomic Force

This study focused on the ultrasonic nanomachining by atomic force microscopy (AFM) to understand the phenomena of the ultrasonic nanomachining. The workpiece is an Au/Ti thin film and coated on the quartz crystal resonator (QCR). The ultrasound vibration of workpiece is carried out by used the Quartz crystal microbalance (QCM). And a normal force measurement model was built by force curve measurements in ultrasound vibration environment. The influence of different experimental parameters can be studied such as normal force and repeat number on the cutting depth and chip stacking. After the experiments, it can be found that the ultrasonic nanomachining by AFM is possessed great influence on the cutting depth.

scholarly journals Особенности наноструктурирования поверхности кремния в результате ее сверхбыстрого нагрева фемтосекундным лазерным импульсом в воде

2018 ◽  
Vol 44 (14) ◽  
pp. 58
Author(s):  
С.А. Ромашевский
Keyword(s):  
Atomic Force Microscopy ◽  
Laser Pulse ◽  
Femtosecond Laser ◽  
Surface Morphology ◽  
Silicon Surface ◽  
Ablation Threshold ◽  
Water Environment ◽  
Force Microscopy ◽  
Atomic Force ◽  
Minimum Depth

AbstractSilicon surface morphology induced by a femtosecond laser pulse at near-threshold fluences in water environment is investigated by means of atomic-force microscopy (AFM). With increasing fluence, the silicon surface transforms into nanoscale ring-shaped and blister structures, as well as smooth and nanostructured microcraters with a minimum depth of 1 nm. The formation of starlike patterns imprinted at the surface of microcraters at fluences above the ablation threshold is observed.

Imaging Dielectric Properties of Si Nanowire Oxide with Conductive Atomic Force Microscopy Complemented with Femtosecond Laser Illumination

Nano Letters ◽  
2008 ◽  
Vol 8 (7) ◽  
pp. 1949-1953 ◽  
Author(s):  
Emmanuel Stratakis ◽  
Nipun Misra ◽  
Emmanuel Spanakis ◽  
David J. Hwang ◽  
Costas P. Grigoropoulos ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Dielectric Properties ◽  
Femtosecond Laser ◽  
Conductive Atomic Force Microscopy ◽  
Laser Illumination ◽  
Force Microscopy ◽  
Si Nanowire ◽  
Atomic Force
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