Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces

2000 ◽  
Vol 87 (6) ◽  
pp. 2719-2725 ◽  
Author(s):  
C. Hopf ◽  
T. Schwarz-Selinger ◽  
W. Jacob ◽  
A. von Keudell
Keyword(s):  
Carbon Film ◽  
Surface Loss ◽  
Loss Probabilities ◽  
Hydrocarbon Radicals ◽  
Amorphous Hydrogenated Carbon

Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H2 and N2 mixture gases

2010 ◽  
Vol 107 (10) ◽  
pp. 103310 ◽  
Author(s):  
Chang Sung Moon ◽  
Keigo Takeda ◽  
Seigo Takashima ◽  
Makoto Sekine ◽  
Yuichi Setsuhara ◽  
...  
Keyword(s):  
Surface Loss ◽  
Loss Probabilities

scholarly journals TALIF measurements of hydrogen and deuterium surface loss probabilities on quartz in low pressure high density plasmas

2020 ◽  
Author(s):  
Xin Yang ◽  
Dmitry Kogut ◽  
Lenaic Couedel ◽  
Thierry Angot ◽  
Pascale Roubin ◽  
...  
Keyword(s):  
Low Pressure ◽  
High Density ◽  
Surface Loss ◽  
Loss Probabilities

Structural Disorder in Hard Amorphous Carbon Films Implanted with Nitrogen Ions

1995 ◽  
Vol 396 ◽  
Author(s):  
F.L. Freire ◽  
D.F. Franceschini ◽  
C.A. Achete ◽  
R.S. Brusa ◽  
G. Mariotto ◽  
...  
Keyword(s):  
Carbon Film ◽  
Positron Annihilation Spectroscopy ◽  
Structural Disorder ◽  
Carbon Films ◽  
Structural Modifications ◽  
Self Bias ◽  
S Parameter ◽  
Nitrogen Ions ◽  
Amorphous Hydrogenated Carbon

AbstractHard amorphous hydrogenated carbon films deposited by self-bias glow discharge were implanted at room temperature with 70 keV-nitrogen ions at fluences between 2.0 and 9.0×1016 N/cm2. The implanted samples were analyzed by Raman spectroscopy, SIMS and positron annihilation spectroscopy (Doppler broadening technique with the determination of the parameter S. For samples implanted with 2.0x1016 N/cm2 the S parameter follows the vacancies depth profile predicted by Monte Carlo simulation. For higher fluences we observed a reduction in the measured value of S. This result is discussed in terms of both hydrogen loss and structural modifications(increase of disorder at local scale and of the number of graphitic domains) induced in the carbon film by ion implantation.

Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition

1998 ◽  
Vol 555 ◽  
Author(s):  
Xiao-Hua Chen ◽  
Laren M. Tolbert ◽  
Z. Y. Ning ◽  
Dennis W. Hess
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Benzene Vapor ◽  
Plasma Etch ◽  
Ecr Plasma ◽  
Amorphous Hydrogenated Carbon

AbstractAmorphous hydrogenated carbon thin films have been deposited from benzene vapor in a microwave electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD) system. Plasma enhanced dissociation and reaction of benzene were monitored by mass spectrometry. Deposited films were characterized by Fourier transform infrared spectroscopy and fluorescence spectroscopy. The effect of the deposition rate on the film density and plasma etch resistance was also studied. The etch resistance of deposited carbon film is higher than the conventional resist Novolac.

Structure of amorphous hydrogenated carbon film prepared from rf plasma deposition

Carbon ◽  
1993 ◽  
Vol 31 (7) ◽  
pp. 1049-1055 ◽  
Author(s):  
Noriko Yoshizawa ◽  
Yoshio Yamada ◽  
Minoru Shiraishi
Keyword(s):  
Plasma Deposition ◽  
Carbon Film ◽  
Rf Plasma ◽  
Amorphous Hydrogenated Carbon

Tribological Behavior of Amorphous Hydrogenated Carbon Films on Silicon

1994 ◽  
Vol 116 (3) ◽  
pp. 454-462 ◽  
Author(s):  
A. K. Gangopadhyay ◽  
W. C. Vassell ◽  
M. A. Tamor ◽  
P. A. Willermet
Keyword(s):  
Relative Humidity ◽  
Contact Stress ◽  
Wear Behavior ◽  
Carbon Film ◽  
Film Deposition ◽  
Steel Ball ◽  
Sliding Speed ◽  
Wear Rates ◽  
Carbon Carbon Bond ◽  
Amorphous Hydrogenated Carbon

Unlike polycrystalline diamond films, amorphous hydrogenated carbon (AHC) films can be deposited at room temperature, are amorphous in atomic structure, and form very smooth surfaces. Amorphous hydrogenated carbon film consists of very small 10–20 Å sp2 bonded (graphitic) clusters captured in a largely sp3 coordinated, partially hydrogenated random network of covalently bonded carbon. Because of the extreme stiffness of the carbon-carbon bond, this hydrocarbon composite, less dense even than graphite, exhibits hardness rivaling that of the hardest ceramics. We report a systematic study of the tribological characteristics of AHC films deposited on silicon substrates by radio frequency plasma assisted chemical vapor deposition. The friction and wear behavior of these films in sliding contact with a steel ball without any lubrication was evaluated as a function of film deposition conditions, contact stress, sliding speed, sliding distance, and relative humidity. The friction coefficient and the wear of both the contacting surfaces were found to increase with relative humidity. At low relative humidity, (a) the films exhibited friction coefficients in the range of 0.05–0.16 under a contact stress ranging from 0.83 to 1.66 GPa and a sliding speed ranging from 0.03 to 1 m/s and (b) the wear rates of the film and the steel ball were significantly lower than that of other hard coating, such as TiN or TiC, evaluated under similar conditions. These results are very encouraging for some tribological applications of AHC films.

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