Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H2 and N2 mixture gases

2010 ◽  
Vol 107 (10) ◽  
pp. 103310 ◽  
Author(s):  
Chang Sung Moon ◽  
Keigo Takeda ◽  
Seigo Takashima ◽  
Makoto Sekine ◽  
Yuichi Setsuhara ◽  
...  
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Xin Yang ◽  
Dmitry Kogut ◽  
Lenaic Couedel ◽  
Thierry Angot ◽  
Pascale Roubin ◽  
...  

1999 ◽  
Vol 74 (25) ◽  
pp. 3800-3802 ◽  
Author(s):  
C. Hopf ◽  
K. Letourneur ◽  
W. Jacob ◽  
T. Schwarz-Selinger ◽  
A. von Keudell

2000 ◽  
Vol 87 (6) ◽  
pp. 2719-2725 ◽  
Author(s):  
C. Hopf ◽  
T. Schwarz-Selinger ◽  
W. Jacob ◽  
A. von Keudell

BDJ ◽  
2002 ◽  
Vol 192 (1) ◽  
pp. 11-23 ◽  
Author(s):  
S J Davies ◽  
R J M Gray ◽  
A J E Qualtrough
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