On the migration behavior of metal impurities in Si during secondary ion mass spectrometry profiling using low-energy oxygen ions

Prakash N. K. Deenapanray; Mladen Petravic

doi:10.1063/1.370302

On the migration behavior of metal impurities in Si during secondary ion mass spectrometry profiling using low-energy oxygen ions

Journal of Applied Physics ◽

10.1063/1.370302 ◽

1999 ◽

Vol 85 (8) ◽

pp. 3993-3998 ◽

Cited By ~ 8

Author(s):

Prakash N. K. Deenapanray ◽

Mladen Petravic

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Migration Behavior ◽

Oxygen Ions ◽

Metal Impurities ◽

Ion Mass Spectrometry ◽

Secondary Ion

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The advantages of normal incidence ultra-low energy secondary ion mass spectrometry depth profiling

Applied Surface Science ◽

10.1016/s0169-4332(98)00812-5 ◽

1999 ◽

Vol 144-145 ◽

pp. 292-296 ◽

Cited By ~ 22

Author(s):

T.J Ormsby ◽

D.P Chu ◽

M.G Dowsett ◽

G.A Cooke ◽

S.B Patel

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Normal Incidence ◽

Low Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Ultrastatic secondary ion mass spectrometry using very-low-energy reactive ions

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(91)95188-j ◽

1991 ◽

Vol 59-60 ◽

pp. 116-119

Author(s):

Tanaka Tohru ◽

Maruo Tetsuya ◽

Homma Yoshikazu ◽

Kurosawa Satoru

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Reactive Ions

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The mechanism of simultaneous implantation and sputtering by high energy oxygen ions during secondary ion mass spectrometry (SIMS) analysis

Surface Science ◽

10.1016/0039-6028(74)90105-8 ◽

1974 ◽

Vol 44 (1) ◽

pp. 247-252 ◽

Cited By ~ 58

Author(s):

J.C.C. Tsai ◽

J.M. Morabito

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

High Energy ◽

Oxygen Ions ◽

Ion Mass Spectrometry ◽

Sims Analysis ◽

Secondary Ion

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Evaluation of polyencapsulation, oxygen leak, and low energy ion bombardment in the reduction of secondary ion mass spectrometry surface ion yield transients

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586356 ◽

1992 ◽

Vol 10 (1) ◽

pp. 342 ◽

Cited By ~ 11

Author(s):

S. F. Corcoran

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ion Bombardment ◽

Low Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Two-dimensional profiling of large tilt angle, low energy boron implanted structure using secondary-ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588473 ◽

1996 ◽

Vol 14 (1) ◽

pp. 348 ◽

Cited By ~ 7

Author(s):

G. A. Cooke

Keyword(s):

Mass Spectrometry ◽

Tilt Angle ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Two Dimensional ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Characterization of nitrogen distribution in HfO2 with low energy secondary ion mass spectrometry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1914811 ◽

2005 ◽

Vol 23 (4) ◽

pp. 589-592 ◽

Cited By ~ 4

Author(s):

Z. X. Jiang ◽

K. Kim ◽

J. Lerma ◽

D. Sieloff ◽

T. Y. Luo ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Nitrogen Distribution ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Depth profiling using ultra-low-energy secondary ion mass spectrometry

Applied Surface Science ◽

10.1016/s0169-4332(02)00630-x ◽

2003 ◽

Vol 203-204 ◽

pp. 5-12 ◽

Cited By ~ 55

Author(s):

M.G. Dowsett

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Low Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Detecting Real Oxygen Ions in Polycrystalline Diamond Thin Film using Secondary Ion Mass Spectrometry

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.3391 ◽

2007 ◽

Vol 46 (6A) ◽

pp. 3391-3393 ◽

Cited By ~ 6

Author(s):

Tsubasa Nakagawa ◽

Isao Sakaguchi ◽

Hajime Haneda ◽

Naoki Ohashi ◽

Yuichi Ikuhara

Keyword(s):

Thin Film ◽

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Polycrystalline Diamond ◽

Oxygen Ions ◽

Diamond Thin Film ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Structural analysis of mono- and bis-sulfated glycosphingolipids by negative liquid secondary ion mass spectrometry with high- and low-energy collision-induced dissociation

Carbohydrate Research ◽

10.1016/0008-6215(95)00106-4 ◽

1995 ◽

Vol 273 (1) ◽

pp. 41-52 ◽

Cited By ~ 22

Author(s):

Keiko Tadano-Aritomi ◽

Harumi Kubo ◽

Philip Ireland ◽

Masaru Okuda ◽

...

Keyword(s):

Mass Spectrometry ◽

Structural Analysis ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Collision Induced Dissociation ◽

Energy Collision ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Process and materials characterization using low energy secondary ion mass spectrometry (SIMS)

2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) ◽

10.1109/icsict.2001.982078 ◽

2005 ◽

Author(s):

Shifeng Lu ◽

S. Patel

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Low Energy ◽

Materials Characterization ◽

Ion Mass Spectrometry ◽

Secondary Ion

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