Pseudomorphic growth of ultrathin cubic 3C–SiC films on Si(100) by temperature programmed organometallic chemical vapor deposition

Jens Hofmann; Stan Veprek; J. Heindl

doi:10.1063/1.369582

Pseudomorphic growth of ultrathin cubic 3C–SiC films on Si(100) by temperature programmed organometallic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.369582 ◽

1999 ◽

Vol 85 (5) ◽

pp. 2652-2657 ◽

Cited By ~ 15

Author(s):

Jens Hofmann ◽

Stan Veprek ◽

J. Heindl

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Temperature Programmed ◽

Pseudomorphic Growth ◽

Sic Films ◽

Organometallic Chemical Vapor Deposition

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Residual stress and texture in poly-SiC films grown by low-pressure organometallic chemical-vapor deposition

Journal of Applied Physics ◽

10.1063/1.372087 ◽

2000 ◽

Vol 87 (4) ◽

pp. 1748-1758 ◽

Cited By ~ 29

Author(s):

E. Hurtós ◽

J. Rodrı́guez-Viejo

Keyword(s):

Residual Stress ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Sic Films ◽

Organometallic Chemical Vapor Deposition

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Relaxation of interfacial stress and improved quality of heteroepitaxial 3C–SiC films on (100)Si deposited by organometallic chemical vapor deposition at 1200 °C

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580482 ◽

1997 ◽

Vol 15 (1) ◽

pp. 10-17 ◽

Cited By ~ 38

Author(s):

S. Vepřek ◽

Th. Kunstmann ◽

D. Volm ◽

B. K. Meyer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Interfacial Stress ◽

Sic Films ◽

Organometallic Chemical Vapor Deposition

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Grazing incidence reflectance of SiC films produced by plasma-assisted chemical vapor deposition

Applied Optics ◽

10.1364/ao.27.001499 ◽

1988 ◽

Vol 27 (8) ◽

pp. 1499 ◽

Cited By ~ 7

Author(s):

Ritva A. M. Keski-Kuha ◽

John F. Osantowski ◽

Albert R. Toft ◽

William D. Partlow

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Grazing Incidence ◽

Sic Films

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Self-ordering and confinement in strained InGaAs/AlGaAs V-groove quantum wires grown by low-pressure organometallic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.120850 ◽

1998 ◽

Vol 72 (6) ◽

pp. 701-703 ◽

Cited By ~ 28

Author(s):

E. Martinet ◽

F. Reinhardt ◽

A. Gustafsson ◽

G. Biasiol ◽

E. Kapon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Quantum Wires ◽

Chemical Vapor ◽

Low Pressure ◽

Organometallic Chemical Vapor Deposition

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Organometallic Chemical Vapor Deposition of Superconducting YBaCuO Films and Post-Deposition Processing

Science and Technology of Thin Film Superconductors ◽

10.1007/978-1-4684-5658-5_35 ◽

1989 ◽

pp. 295-299 ◽

Cited By ~ 2

Author(s):

J. Zhao ◽

H. O. Marcy ◽

L. M. Tonge ◽

B. W. Wessels ◽

T. J. Marks ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Post Deposition ◽

Organometallic Chemical Vapor Deposition

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GAS PHASE REACTION IN SYNTHESIS OF SiC FILMS BY LOW PRESSURE CHEMICAL VAPOR DEPOSITION FROM Si2H6 AND C2H2 AT 873 K

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1991210 ◽

1991 ◽

Vol 02 (C2) ◽

pp. C2-87-C2-93

Author(s):

L.-S. HONG ◽

Y. SHIMOGAKI ◽

H. KOMIYAMA

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Phase Reaction ◽

Gas Phase Reaction ◽

Pressure Chemical ◽

Sic Films

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Kinetics of evaporation of barium THD precursors used for organometallic chemical vapor deposition (OMCVD) thin films

Journal of Crystal Growth ◽

10.1016/s0022-0248(97)00021-3 ◽

1997 ◽

Vol 174 (1-4) ◽

pp. 801-805 ◽

Cited By ~ 7

Author(s):

V. Burtman ◽

M. Schieber ◽

S. Yitzchaik ◽

Y. Yaroslavsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Kinetics Of ◽

Organometallic Chemical Vapor Deposition

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Fast preparation of (111)-oriented β-SiC films without carbon formation by laser chemical vapor deposition from hexamethyldisilane without H2

Journal of the American Ceramic Society ◽

10.1111/jace.15315 ◽

2017 ◽

Vol 101 (4) ◽

pp. 1471-1478 ◽

Cited By ~ 4

Author(s):

Qingfang Xu ◽

Peipei Zhu ◽

Qingyun Sun ◽

Rong Tu ◽

Song Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Formation ◽

Laser Chemical Vapor Deposition ◽

Sic Films

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ChemInform Abstract: Organometallic Chemical Vapor Deposition of III/V Compound Semiconductors with Novel Organometallic Precursors.

ChemInform ◽

10.1002/chin.198851274 ◽

1988 ◽

Vol 19 (51) ◽

Author(s):

A. H. COWLEY ◽

B. L. BENAC ◽

J. G. EKERDT ◽

R. A. JONES ◽

K. B. KIDD ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Compound Semiconductors ◽

Organometallic Precursors ◽

Organometallic Chemical Vapor Deposition

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Organometallic chemical vapor deposition of strontium titanate

Journal of Applied Physics ◽

10.1063/1.345034 ◽

1990 ◽

Vol 67 (8) ◽

pp. 3858-3861 ◽

Cited By ~ 49

Author(s):

W. A. Feil ◽

B. W. Wessels ◽

L. M. Tonge ◽

T. J. Marks

Keyword(s):

Chemical Vapor Deposition ◽

Strontium Titanate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organometallic Chemical Vapor Deposition

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