scholarly journals Thermal stability of Si/Si1−x−yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition

1999 ◽  
Vol 85 (4) ◽  
pp. 2124-2128 ◽  
Author(s):  
C. W. Liu ◽  
Y. D. Tseng ◽  
M. Y. Chern ◽  
C. L. Chang ◽  
J. C. Sturm
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Quantum Wells ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thermal Chemical Vapor Deposition ◽  
Thermal Stability Of

The thermal stability of SiGe films deposited by ultrahigh‐vacuum chemical vapor deposition

1991 ◽  
Vol 70 (3) ◽  
pp. 1416-1420 ◽  
Author(s):  
S. R. Stiffler ◽  
J. H. Comfort ◽  
C. L. Stanis ◽  
D. L. Harame ◽  
E. de Frésart ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Thermal Stability Of

Thermal Stability of Cubic Boron Nitride Films Deposited by Chemical Vapor Deposition.

ChemInform ◽  
2007 ◽  
Vol 38 (2) ◽  
Author(s):  
J. Yu ◽  
Z. Zheng ◽  
H. C. Ong ◽  
K. Y. Wong ◽  
S. Matsumoto ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Cubic Boron Nitride ◽  
Chemical Vapor ◽  
Boron Nitride Films ◽  
Thermal Stability Of
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