In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Ryoichi Nozawa; Hirohisa Takeda; Masafumi Ito; Masaru Hori; Toshio Goto

doi:10.1063/1.369242

In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Journal of Applied Physics ◽

10.1063/1.369242 ◽

1999 ◽

Vol 85 (2) ◽

pp. 1172-1177 ◽

Cited By ~ 23

Author(s):

Ryoichi Nozawa ◽

Hirohisa Takeda ◽

Masafumi Ito ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogen Plasma ◽

Hydrogenated Amorphous Silicon ◽

Silicon Surfaces ◽

In Situ Observation ◽

Hydrogenated Amorphous ◽

Plasma Annealing

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Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Cited By ~ 41

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays

Proceedings of the IEEE ◽

10.1109/jproc.2005.851533 ◽

2005 ◽

Vol 93 (7) ◽

pp. 1364-1373 ◽

Cited By ~ 11

Author(s):

A.J. Flewitt ◽

W.I. Milne

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Flexible Displays ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Hydrogenated Amorphous

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Effect of Microwave Pulse on the Deposition Rate of Hydrogenated Amorphous Silicon in the Electron Cyclotron Resonance Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l1191 ◽

1995 ◽

Vol 34 (Part 2, No. 9B) ◽

pp. L1191-L1193 ◽

Cited By ~ 5

Author(s):

Ju-Hyeon Lee ◽

Sang Kook Park ◽

Chang Sik Kim

Keyword(s):

Amorphous Silicon ◽

Deposition Rate ◽

Cyclotron Resonance ◽

Microwave Pulse ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Journal of Applied Physics ◽

10.1063/1.338013 ◽

1987 ◽

Vol 61 (5) ◽

pp. 2084-2087 ◽

Cited By ~ 8

Author(s):

M. Kitagawa ◽

K. Setsune ◽

Y. Manabe ◽

T. Hirao

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD

Japanese Journal of Applied Physics ◽

10.1143/jjap.26.l231 ◽

1987 ◽

Vol 26 (Part 2, No. 4) ◽

pp. L231-L233 ◽

Cited By ~ 22

Author(s):

Masatoshi Kitagawa ◽

Shin-ichiro Ishihara ◽

Kentaro Setsune ◽

Yoshio Manabe ◽

Takashi Hirao

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Plasma Cvd ◽

Low Temperature Preparation ◽

Hydrogenated Amorphous ◽

Resonance Plasma ◽

Temperature Preparation

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Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.122954 ◽

1999 ◽

Vol 74 (1) ◽

pp. 67-69 ◽

Cited By ~ 2

Author(s):

Y. J. Song ◽

W. A. Anderson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.44-46.135 ◽

1995 ◽

Vol 44-46 ◽

pp. 135-180 ◽

Cited By ~ 5

Author(s):

M. Zhang ◽

Yukihiro Nakayama

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effect of Microwave Pulse on the Optical Properties of Hydrogenated Amorphous Silicon Thin Films Deposited by Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.6867 ◽

1997 ◽

Vol 36 (Part 1, No. 11) ◽

pp. 6867-6870

Author(s):

Ju-Hyeon Lee ◽

Il-Chae Jung ◽

Sang-Kook Park ◽

Cheong-A Baek ◽

Sung Park

Keyword(s):

Thin Films ◽

Optical Properties ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Microwave Pulse ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Silicon Thin Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Growth and characterization of hydrogenated amorphous silicon prepared using a combined hot wire and electron cyclotron resonance plasma deposition technique

10.31274/rtd-20200803-335 ◽

2003 ◽

Author(s):

Matthew Alan Ring

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Hydrogenated Amorphous Silicon ◽

Hot Wire ◽

Deposition Technique ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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