Effects of oxygen content on properties of silicon oxide films prepared at room temperature by sputtering-type electron cyclotron resonance plasma

Katsuhiko Furukawa; Yichun Liu; Hiroshi Nakashima; Dawei Gao; Yasuhiro Kashiwazaki; Kiichiro Uchino; Katsunori Muraoka; Hirohisa Tsuzuki

doi:10.1063/1.368683

Effects of oxygen content on properties of silicon oxide films prepared at room temperature by sputtering-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.368683 ◽

1998 ◽

Vol 84 (8) ◽

pp. 4579-4584 ◽

Cited By ~ 5

Author(s):

Katsuhiko Furukawa ◽

Yichun Liu ◽

Hiroshi Nakashima ◽

Dawei Gao ◽

Yasuhiro Kashiwazaki ◽

...

Keyword(s):

Oxygen Content ◽

Cyclotron Resonance ◽

Room Temperature ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

ChemInform ◽

10.1002/chin.199002353 ◽

1990 ◽

Vol 21 (2) ◽

Author(s):

NGUYEN SON VAN NGUYEN SON VAN ◽

K. ALBAUGH

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

Journal of The Electrochemical Society ◽

10.1149/1.2096295 ◽

1989 ◽

Vol 136 (10) ◽

pp. 2835-2840 ◽

Cited By ~ 14

Author(s):

Son Van Nguyen ◽

Kevin Albaugh

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor.

Thin Solid Films ◽

10.1016/0040-6090(96)80068-x ◽

1995 ◽

Vol 270 (1-2) ◽

pp. 49-54 ◽

Cited By ~ 12

Author(s):

J.C. Rostaing ◽

F. Coeuret ◽

J. Pelletier ◽

T. Lagarde ◽

R. Etemadi

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silica Coatings ◽

Resonance Plasma

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Effect of preoxidation on deposition of thin gate-quality silicon oxide film at low temperature by using a sputter-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.366431 ◽

1997 ◽

Vol 82 (11) ◽

pp. 5680-5685 ◽

Cited By ~ 26

Author(s):

D. W. Gao ◽

Y. Kashiwazaki ◽

K. Muraoka ◽

H. Nakashima ◽

K. Furukawa ◽

...

Keyword(s):

Low Temperature ◽

Oxide Film ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Oxide Film ◽

Resonance Plasma

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Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2746331 ◽

2007 ◽

Vol 25 (4) ◽

pp. 1166 ◽

Cited By ~ 4

Author(s):

C. Biasotto ◽

A. M. Daltrini ◽

R. C. Teixeira ◽

F. A. Boscoli ◽

J. A. Diniz ◽

...

Keyword(s):

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Oxide Layers ◽

Resonance Plasma

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Properties of a-SiN x .: H films deposited at room temperature by the electron cyclotron resonance plasma method

Philosophical Magazine B ◽

10.1080/13642819608239130 ◽

1996 ◽

Vol 73 (3) ◽

pp. 487-502 ◽

Cited By ~ 24

Author(s):

S. Garcia ◽

J. M. Martin ◽

M. Fernandez ◽

I. Martil ◽

G. Gonzalez-diaz

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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A Silicon Oxide Antireflective Layer For Optical Lithography Using Electron Cyclotron Resonance Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2863 ◽

1996 ◽

Vol 35 (Part 1, No. 5A) ◽

pp. 2863-2869 ◽

Cited By ~ 8

Author(s):

Yoshiaki Mimura ◽

Mikiho Kiuchi ◽

Kazunori Anzai ◽

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Optical Lithography ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.118912 ◽

1997 ◽

Vol 70 (19) ◽

pp. 2535-2537 ◽

Cited By ~ 68

Author(s):

M. Zarrabian ◽

N. Fourches-Coulon ◽

G. Turban ◽

C. Marhic ◽

M. Lancin

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Nanocrystalline Diamond ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of GaSb in Cl[sub 2]/BCl[sub 3]/CH[sub 4]/Ar/H[sub 2] at room temperature

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1596215 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1511 ◽

Cited By ~ 11

Author(s):

J. P. Langer ◽

P. S. Dutta

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Thermal Improvement and Stability of Si3N4/GeNx/p- and n-Ge Structures Prepared by Electron-Cyclotron-Resonance Plasma Nitridation and Sputtering at Room Temperature

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.090204 ◽

2012 ◽

Vol 51 (9R) ◽

pp. 090204

Author(s):

Yukio Fukuda ◽

Hiroshi Okamoto ◽

Takuro Iwasaki ◽

Kohei Izumi ◽

Yohei Otani ◽

...

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Nitridation ◽

Thermal Improvement ◽

Resonance Plasma

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