scholarly journals Blackbody emission under laser excitation of silicon nanopowder produced by plasma-enhanced chemical-vapor deposition

1998 ◽  
Vol 83 (12) ◽  
pp. 7879-7885 ◽  
Author(s):  
J. Costa ◽  
P. Roura ◽  
J. R. Morante ◽  
E. Bertran
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Laser Excitation ◽  
Chemical Vapor ◽  
Silicon Nanopowder

Low-pressure metalorganic chemical vapor deposition of photoluminescent Eu-doped Y2O3 films

1990 ◽  
Vol 5 (7) ◽  
pp. 1573-1580 ◽  
Author(s):  
Gary A. West ◽  
K. W. Beeson
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Laser Excitation ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Mocvd Reactor ◽  
Reactor Pressure ◽  
Metalorganic Chemical ◽  
The Eu

We have produced thin photoluminescent films of Eu-doped Y2O3 (Y2O3: Eu) by low-pressure metalorganic chemical vapor deposition (MOCVD). Yttrium and europium β-diketonate precursors are thermally decomposed in a hot-walled MOCVD reactor in the presence of oxygen at a total reactor pressure of 1 Torr. The films are microcrystalline and photoluminescent as-deposited and contain <1 at.% of carbon contamination. Subsequent annealing at 1200°C in air enhances and stabilizes the luminescence. We have measured the photoluminescent lifetimes of the MOCVD films as a function of temperature for the Eu+35D1 ⇉ 7F1 and 5D0 ⇉ 7F2 transitions using excimer laser excitation at 248 nm. We present a kinetic model which can account for the observed emission lifetimes from 20–1000°C.

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

Coating of continuous carbon fibers with double layers by chemical vapor deposition

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-885-Pr3-892 ◽  
Author(s):  
N. Popovska ◽  
S. Schmidt ◽  
E. Edelmann ◽  
V. K. Wunder ◽  
H. Gerhard ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Fibers ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Double Layers
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