Investigation of the properties of plasma-enhanced chemical vapor deposited silicon nitride and its effect on silicon surface passivation
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2013 ◽
Vol 210
(11)
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pp. 2399-2403
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2016 ◽
Vol 6
(4)
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pp. 900-905
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2015 ◽
Vol 5
(4)
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pp. 1047-1052
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2018 ◽
pp. 73-80
2017 ◽
Vol 56
(8S2)
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pp. 08MB12
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