Investigation of the properties of plasma-enhanced chemical vapor deposited silicon nitride and its effect on silicon surface passivation

1998 ◽  
Vol 83 (11) ◽  
pp. 5885-5889 ◽  
Author(s):  
L. Cai ◽  
A. Rohatgi ◽  
S. Han ◽  
G. May ◽  
M. Zou
2011 ◽  
Vol 98 (15) ◽  
pp. 153514 ◽  
Author(s):  
Jan-Willem A. Schüttauf ◽  
Karine H. M. van der Werf ◽  
Inge M. Kielen ◽  
Wilfried G. J. H. M. van Sark ◽  
Jatindra K. Rath ◽  
...  

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