Spin injection from two-dimensional electron and hole gases in resonant tunneling diodes

2011 ◽  
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Y. Galvão Gobato ◽  
H. V. A. Galeti ◽  
L. F. dos Santos ◽  
V. López-Richard ◽  
D. F. Cesar ◽  
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1990 ◽  
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Philip F. Bagwell ◽  
Tom P. E. Broekaert ◽  
T. P. Orlando ◽  
Clifton G. Fonstad

2012 ◽  
Vol 7 (1) ◽  
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Leonilson KS Herval ◽  
Helder VA Galeti ◽  
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Maria JSP Brasil ◽  
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2018 ◽  
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H. V. A. Galeti ◽  
Y. Galvão Gobato ◽  
M. J. S. P. Brasil ◽  
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M. Henini

2011 ◽  
Vol 27 (1) ◽  
pp. 015018 ◽  
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H V A Galeti ◽  
Y Galvão Gobato ◽  
V O Gordo ◽  
L F dos Santos ◽  
M J S P Brasil ◽  
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H V A Galeti ◽  
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2000 ◽  
Vol 631 ◽  
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E. Chow ◽  
S.-Y. Lin

ABSTRACTResonance Tunneling Diodes (RTDs) are devices that can demonstrate very highspeed operation. Typically they have been fabricated using epitaxial techniques and materials not consistent with standard commercial integrated circuits. We report here the first demonstration of SiO2-Si-SiO2 RTDs. These new structures were fabricated using novel combinations of silicon integrated circuit processes.


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