Probing the electrostatics of self-assembled monolayers by means of beveled metal-oxide-semiconductor structures

2011 ◽  
Vol 99 (23) ◽  
pp. 233508 ◽  
Author(s):  
Lior Kornblum ◽  
Yair Paska ◽  
Jonathan A. Rothschild ◽  
Hossam Haick ◽  
Moshe Eizenberg
Keyword(s):  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Self Assembled Monolayers ◽  
Semiconductor Structures ◽  
Assembled Monolayers ◽  
Self Assembled

Interface/border trap characterization of Al2O3/AlN/GaN metal-oxide-semiconductor structures with an AlN interfacial layer

2015 ◽  
Vol 106 (5) ◽  
pp. 051605 ◽  
Author(s):  
Shenghou Liu ◽  
Shu Yang ◽  
Zhikai Tang ◽  
Qimeng Jiang ◽  
Cheng Liu ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Interfacial Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Structures

Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al2O3 prepared by atomic layer deposition

2010 ◽  
Vol 107 (10) ◽  
pp. 106104 ◽  
Author(s):  
D. Gregušová ◽  
R. Stoklas ◽  
Ch. Mizue ◽  
Y. Hori ◽  
J. Novák ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Trap States ◽  
Semiconductor Structures ◽  
Layer Deposition

scholarly journals Perovskite Metal–Oxide–Semiconductor Structures for Interface Characterization

2021 ◽  
pp. 2101004
Author(s):  
José M. V. Cunha ◽  
M. Alexandra Barreiros ◽  
Marco A. Curado ◽  
Tomás S. Lopes ◽  
Kevin Oliveira ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Interface Characterization ◽  
Semiconductor Structures

Bonding and Penetration at Metal/Self-Assembled Organic Monolayer Interfaces

1995 ◽  
Vol 385 ◽  
Author(s):  
D. R. Jung ◽  
A. W. Czanderna ◽  
G. C. Herdt
Keyword(s):  
Metal Oxide ◽  
Environmental Conditions ◽  
Interfacial Properties ◽  
Self Assembled Monolayers ◽  
Organic Substrates ◽  
Research Results ◽  
Organic Monolayer ◽  
Organic Interfaces ◽  
Assembled Monolayers ◽  
Self Assembled

ABSTRACTThe purpose of research on metals (M) deposited onto self-assembled monolayers (SAMs) is to understand the interactions between the metal and eventually metal oxide overlayers on well-ordered organic substrates. Applications of M/SAM and inorganic/SAM research results to the understanding of real inorganic/organic interfaces in vacuum and under environmental conditions can potentially play a key role in the development of advanced devices with stable interfacial properties. The results of selected M/SAM studies to date are reviewed, and MISAM combinations ranked according to reactivity and penetration. Specific examples of reactive interfaces (Cu/COOH, Cr/several groups) and nonreactive interfaces with penetration (Ag/CH3, Ag/COOH) are used to illustrate the extremes.

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