Model for noncollisional heating in inductively coupled plasma processing sources

1997 ◽  
Vol 81 (9) ◽  
pp. 5966-5974 ◽  
Author(s):  
Shahid Rauf ◽  
Mark J. Kushner
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Inductively Coupled

Modelling of inductively coupled plasma processing reactors

2001 ◽  
Vol 34 (18) ◽  
pp. 2742-2747 ◽  
Author(s):  
Deepak Bose ◽  
David Hash ◽  
T R Govindan ◽  
M Meyyappan
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Inductively Coupled ◽  
Plasma Processing Reactors

Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experiments

2014 ◽  
Vol 47 (45) ◽  
pp. 455201 ◽  
Author(s):  
E Despiau-Pujo ◽  
M Brihoum ◽  
P Bodart ◽  
M Darnon ◽  
G Cunge
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Inductively Coupled ◽  
Model Versus

Spheroidization of tantalum powder by radio frequency inductively coupled plasma processing

2019 ◽  
Vol 30 (8) ◽  
pp. 1709-1714 ◽  
Author(s):  
Qian Qin ◽  
Fang Yang ◽  
Tao Shi ◽  
Zhimeng Guo ◽  
Haixia Sun ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Tantalum Powder ◽  
Inductively Coupled

Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices

RSC Advances ◽  
2015 ◽  
Vol 5 (78) ◽  
pp. 63572-63579 ◽  
Author(s):  
Debajyoti Das ◽  
Basudeb Sain
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Cost Effective ◽  
Single Step ◽  
High Density ◽  
Gas Mixture ◽  
Photovoltaic Devices ◽  
Rapid Synthesis ◽  
Inductively Coupled

A rapid and single step synthesis of nc-Si/a-SiNx:H QD thin films has been made possible from a (SiH4 + NH3) gas mixture, with the advent of high density low pressure planar inductively coupled plasma processing.

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