scholarly journals Electrical description of an inductively coupled plasma processing reactor with discharge parameters calculated from a global model

AIP Advances ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 035216
Author(s):  
Minglu Cao ◽  
Yijia Lu ◽  
Jia Cheng ◽  
Linhong Ji
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Global Model ◽  
Inductively Coupled ◽  
Discharge Parameters

Global model analysis of Ar inductively coupled plasma driven by a 150 kHz-band high-power pulse burst

2019 ◽  
Vol 58 (SA) ◽  
pp. SAAB06
Author(s):  
Yuma Saito ◽  
Kodai Shibata ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
...  
Keyword(s):  
High Power ◽  
Inductively Coupled Plasma ◽  
Model Analysis ◽  
Global Model ◽  
Pulse Burst ◽  
Inductively Coupled ◽  
Power Pulse ◽  
High Power Pulse

Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma

2009 ◽  
Vol 18 (2) ◽  
pp. 025001 ◽  
Author(s):  
L Lallement ◽  
A Rhallabi ◽  
C Cardinaud ◽  
M C Peignon-Fernandez ◽  
L L Alves
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Pressure ◽  
Global Model ◽  
Inductively Coupled

Modelling of inductively coupled plasma processing reactors

2001 ◽  
Vol 34 (18) ◽  
pp. 2742-2747 ◽  
Author(s):  
Deepak Bose ◽  
David Hash ◽  
T R Govindan ◽  
M Meyyappan
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Inductively Coupled ◽  
Plasma Processing Reactors

Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating

2020 ◽  
Vol 27 (7) ◽  
pp. 073507
Author(s):  
Deuk-Chul Kwon ◽  
Dong-Hun Yu ◽  
Hyoungcheol Kwon ◽  
Yeon Ho Im ◽  
Hyo-Chang Lee
Keyword(s):  
Inductively Coupled Plasma ◽  
Density Ratio ◽  
Global Model ◽  
Electron Heating ◽  
Plasma Sources ◽  
Inductively Coupled ◽  
Center Density
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