A three‐dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
2005 ◽
Vol 34
(6)
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pp. 740-745
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2015 ◽
Vol 32
(5)
◽
pp. 058102
◽
1999 ◽
Vol 17
(3)
◽
pp. 768-773
◽