In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO2 on Si and Ge substrates
Keyword(s):
X Ray
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2013 ◽
Vol 107
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pp. 151-155
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Keyword(s):
2011 ◽
Vol 115
(14)
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pp. 6605-6610
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