Hydrogen incorporation in silicon nitride films deposited by remote electron‐cyclotron‐resonance chemical vapor deposition

David E. Kotecki; Jonathan D. Chapple‐Sokol

doi:10.1063/1.358930

Hydrogen incorporation in silicon nitride films deposited by remote electron‐cyclotron‐resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.358930 ◽

1995 ◽

Vol 77 (3) ◽

pp. 1284-1293 ◽

Cited By ~ 26

Author(s):

David E. Kotecki ◽

Jonathan D. Chapple‐Sokol

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogen Incorporation ◽

Silicon Nitride Films

Download Full-text

I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Passivation of GaAs Power Field-Effect Transistor Using Electron Cyclotron Resonance Chemical Vapor Deposition Silicon Nitride Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l1659 ◽

1994 ◽

Vol 33 (Part 2, No. 12A) ◽

pp. L1659-L1661 ◽

Cited By ~ 3

Author(s):

Edward Yi Chang ◽

Kun-Chun Lin ◽

Janne-Wha Wu ◽

Tzu-Hung Chen ◽

John-Sea Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Field Effect ◽

Field Effect Transistor ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Effect Transistor

Download Full-text

Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09264-4 ◽

1997 ◽

Vol 294 (1-2) ◽

pp. 214-216 ◽

Cited By ~ 1

Author(s):

E Dufour-Gergam ◽

F Meyer ◽

F Delmotte ◽

M.C Hugon ◽

B Agius ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Sige Layer ◽

Silicon Nitride Films ◽

Resonance Plasma

Download Full-text

Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

Microelectronic Engineering ◽

10.1016/s0167-9317(03)00412-x ◽

2003 ◽

Vol 70 (1) ◽

pp. 109-114 ◽

Cited By ~ 17

Author(s):

K.B. Sundaram ◽

R.E. Sah ◽

H. Baumann ◽

K. Balachandran ◽

R.M. Todi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Wet Etching ◽

Ecr Plasma

Download Full-text

Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582106 ◽

1999 ◽

Vol 17 (2) ◽

pp. 433-444 ◽

Cited By ~ 17

Author(s):

M. Lapeyrade ◽

M. P. Besland ◽

C. Meva’a ◽

A. Sibaï ◽

G. Hollinger

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Thin Solid Films ◽

10.1016/j.tsf.2008.03.010 ◽

2008 ◽

Vol 516 (21) ◽

pp. 7777-7782 ◽

Cited By ~ 11

Author(s):

C. Biasotto ◽

J.A. Diniz ◽

A.M. Daltrini ◽

S.A. Moshkalev ◽

M.J.R. Monteiro

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Analysis of stress and composition of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition for microfabrication processes

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1835316 ◽

2005 ◽

Vol 23 (1) ◽

pp. 168 ◽

Cited By ~ 5

Author(s):

E. Cianci ◽

F. Pirola ◽

V. Foglietti

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Deposition of silicon nitride by low-pressure electron cyclotron resonance plasma enhanced chemical vapor deposition in N[sub 2]/Ar/SiH[sub 4]

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589708 ◽

1997 ◽

Vol 15 (6) ◽

pp. 2682 ◽

Cited By ~ 24

Author(s):

S. A. Moshkalyov

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Low Pressure ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579609 ◽

1995 ◽

Vol 13 (6) ◽

pp. 2900-2907 ◽

Cited By ~ 41

Author(s):

S. Sitbon ◽

M. C. Hugon ◽

B. Agius ◽

F. Abel ◽

J. L. Courant ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Silicon Nitride Films ◽

Temperature Deposition ◽

Resonance Plasma

Download Full-text

Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text