Low‐dose implantation of Sb in Si1−xGexepitaxial layers: Correlation between electrical properties and radiation damage

1994 ◽  
Vol 75 (1) ◽  
pp. 377-381 ◽  
Author(s):  
Z. Atzmon ◽  
M. Eizenberg ◽  
Y. Shacham‐Diamand ◽  
J. W. Mayer ◽  
F. Schäffler
Author(s):  
T.W. Jeng ◽  
W. Chiu

With the advances in preparing biological materials in a thin and highly ordered form, and in maintaining them hydrated under vacuum, electron crystallography has become an important tool for biological structure investigation at high resolution (1,2). However, the electron radiation damage would limit the capability of recording reflections with low intensities in an electron diffraction pattern. It has been demonstrated that the use of a low temperature stage can reduce the radiation damage effect and that one can expose the specimen with a higher dose in order to increase the signal contrast (3). A further improvement can be made by selecting a proper photographic emulsion. The primary factors in evaluating the suitability of photographic emulsion for recording low dose diffraction patterns are speed, fog level, electron response at low electron exposure, linearity, and usable range of exposure. We have compared these factors with three photographic emulsions including Kodak electron microscopic plate (EMP), Industrex AA x-ray film (AA x-ray) and Kodak nuclear track film (NTB3).


2018 ◽  
Vol 72 (5) ◽  
pp. 561-569 ◽  
Author(s):  
Shaida Anwer Kakil ◽  
Barzan Nehmat Sabr ◽  
Lary Slewa Hana ◽  
Tariq Abdul-Hameed Abbas ◽  
Sarwin Yaseen Hussin

2019 ◽  
Vol 26 (4) ◽  
pp. 912-921 ◽  
Author(s):  
Go Ueno ◽  
Atsuhiro Shimada ◽  
Eiki Yamashita ◽  
Kazuya Hasegawa ◽  
Takashi Kumasaka ◽  
...  

To investigate the effect of high-energy X-rays on site-specific radiation-damage, low-dose diffraction data were collected from radiation-sensitive crystals of the metal enzyme cytochrome c oxidase. Data were collected at the Structural Biology I beamline (BL41XU) at SPring-8, using 30 keV X-rays and a highly sensitive pixel array detector equipped with a cadmium telluride sensor. The experimental setup of continuous sample translation using multiple crystals allowed the average diffraction weighted dose per data set to be reduced to 58 kGy, and the resulting data revealed a ligand structure featuring an identical bond length to that in the damage-free structure determined using an X-ray free-electron laser. However, precise analysis of the residual density around the ligand structure refined with the synchrotron data showed the possibility of a small level of specific damage, which might have resulted from the accumulated dose of 58 kGy per data set. Further investigation of the photon-energy dependence of specific damage, as assessed by variations in UV-vis absorption spectra, was conducted using an on-line spectrometer at various energies ranging from 10 to 30 keV. No evidence was found for specific radiation damage being energy dependent.


OBM Genetics ◽  
2018 ◽  
Vol 2 (4) ◽  
pp. 1-1
Author(s):  
Albena Staynova ◽  
◽  
Ljubomira Hadjiiska ◽  
Valeria Hadjidekova ◽  
Rositsa Hristova ◽  
...  

Author(s):  
David A. Armstrong ◽  
Suichu Luo ◽  
David C. Joy

Radiation damage to organic specimens is the major limiting factor in high resolution electron microscopy studies of biological systems. Electron beam irradiation compromises resolution by altering chemical microstructure, resulting in local mass loss and volume shrinkage in a specimen. All significant mass loss is thought to occur prior to a total incident dose of 50 electrons/ square angstrom If this is the case it is hard to reconcile the observation that images must be recorded at doses of less than 100 el/Å in order to avoid excessive mass loss and shrinkage while microanalytical (EDS and EELS) studies of the same tissue are routinely carried out at doses of 104 - 105el/Å2. Also, since most workers typically use either low dose (for imaging) or high dose (for microapalysis) there are apparently no studies in the literature which attempt to follow the process of radiation damage between these two extremes.We have chosen to investigate mass loss in polymer embedding resins such as are routinely used for TEM imaging as well as for X ray microanalytical applications.


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