Effects of additive elements on electrical properties of tantalum oxide films

Hisayoshi Fujikawa; Yasunori Taga

doi:10.1063/1.356227

Effects of additive elements on electrical properties of tantalum oxide films

Journal of Applied Physics ◽

10.1063/1.356227 ◽

1994 ◽

Vol 75 (5) ◽

pp. 2538-2544 ◽

Cited By ~ 66

Author(s):

Hisayoshi Fujikawa ◽

Yasunori Taga

Keyword(s):

Electrical Properties ◽

Tantalum Oxide ◽

Oxide Films

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Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2010.08.002 ◽

2010 ◽

Vol 13 (4) ◽

pp. 245-251 ◽

Cited By ~ 13

Author(s):

S.V. Jagadeesh Chandra ◽

Chel-Jong Choi ◽

S. Uthanna ◽

G. Mohan Rao

Keyword(s):

Electrical Properties ◽

Radio Frequency ◽

Tantalum Oxide ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Post Deposition Annealing ◽

Structural And Electrical Properties ◽

Post Deposition

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Optical and electrical properties of thermal Tantalum oxide films on silicon

IEEE Transactions on Electron Devices ◽

10.1109/t-ed.1981.20277 ◽

1981 ◽

Vol 28 (1) ◽

pp. 22-27 ◽

Cited By ~ 32

Author(s):

D.J. Smith ◽

L. Young

Keyword(s):

Electrical Properties ◽

Tantalum Oxide ◽

Oxide Films ◽

Optical And Electrical Properties

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Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films

Applied Surface Science ◽

10.1016/j.apsusc.2007.08.005 ◽

2008 ◽

Vol 254 (7) ◽

pp. 1953-1960 ◽

Cited By ~ 53

Author(s):

S.V. Jagadeesh Chandra ◽

S. Uthanna ◽

G. Mohan Rao

Keyword(s):

Electrical Properties ◽

Substrate Temperature ◽

Tantalum Oxide ◽

Oxide Films ◽

Optical And Electrical Properties

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Ejection angle dependence of electrical properties of ion beam sputtered tantalum oxide films

Applied Physics Letters ◽

10.1063/1.104592 ◽

1991 ◽

Vol 58 (6) ◽

pp. 577-579 ◽

Cited By ~ 5

Author(s):

Kengo Ishiyama ◽

Yasunori Taga

Keyword(s):

Electrical Properties ◽

Ion Beam ◽

Tantalum Oxide ◽

Oxide Films ◽

Angle Dependence ◽

Ejection Angle

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Structural and electrical properties of tantalum oxide films grown by photo-assisted pulsed laser deposition

Applied Surface Science ◽

10.1016/s0169-4332(01)00752-8 ◽

2002 ◽

Vol 186 (1-4) ◽

pp. 40-44 ◽

Cited By ~ 17

Author(s):

Jun-Ying Zhang ◽

Ian W Boyd

Keyword(s):

Electrical Properties ◽

Pulsed Laser Deposition ◽

Tantalum Oxide ◽

Oxide Films ◽

Pulsed Laser ◽

Laser Deposition ◽

Structural And Electrical Properties

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The electrical properties of rf sputtered tantalum oxide films

10.1109/edms.1994.863877 ◽

2005 ◽

Author(s):

W.K. Choi ◽

C.H. Ling ◽

K. Sundarain

Keyword(s):

Electrical Properties ◽

Tantalum Oxide ◽

Oxide Films

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Nanoscale Study of the Influence of Atomic Oxygen on the Electrical Properties of LaAlO3 Thin High-k Oxide Films Deposited by Molecular Beam Epitaxy

10.1557/proc-1252-i05-12 ◽

2009 ◽

Cited By ~ 2

Author(s):

Wael Hourani ◽

Liviu Militaru ◽

Brice Gautier ◽

David Albertini ◽

Armel Descamps-Mandine ◽

...

Keyword(s):

Electrical Properties ◽

Molecular Beam Epitaxy ◽

Atomic Oxygen ◽

Molecular Beam ◽

Oxide Films ◽

High K

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Reduction of dielectric loss of sputtered tantalum oxide films

Proceedings of 1998 International Symposium on Electrical Insulating Materials. 1998 Asian International Conference on Dielectrics and Electrical Insulation. 30th Symposium on Electrical Insulating Materials (IEEE Cat. No.98TH8286) ◽

10.1109/iseim.1998.741683 ◽

2002 ◽

Author(s):

K. Maki ◽

E. Itoh ◽

K. Miyairi

Keyword(s):

Dielectric Loss ◽

Tantalum Oxide ◽

Oxide Films

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Effects of oxygen addition on enhancing electrochromic performance of flexible tungsten/tantalum oxide films using an atmospheric pressure plasma jet

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.02.001 ◽

2013 ◽

Vol 221 ◽

pp. 173-181 ◽

Cited By ~ 6

Author(s):

Yung-Sen Lin ◽

Yen-Cheng Chen ◽

Shih-Wei Tien

Keyword(s):

Atmospheric Pressure ◽

Tantalum Oxide ◽

Oxide Films ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma ◽

Oxygen Addition

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Electrical characterisation of RF sputtered tantalum oxide films rapid thermal annealed with Ar, N2, O2 and N2O

Thin Solid Films ◽

10.1016/s0040-6090(98)01622-8 ◽

1999 ◽

Vol 343-344 ◽

pp. 105-107 ◽

Cited By ~ 7

Author(s):

W.K. Choi ◽

L.S. Tan ◽

J.Y. Lim ◽

S.G. Pek

Keyword(s):

Tantalum Oxide ◽

Oxide Films

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