Effects of gate-last and gate-first process on deep submicron inversion-mode InGaAs n-channel metal-oxide-semiconductor field effect transistors

2011 ◽  
Vol 109 (5) ◽  
pp. 053709 ◽  
Author(s):  
J. J. Gu ◽  
Y. Q. Wu ◽  
P. D. Ye
Sign in / Sign up

Export Citation Format

Share Document