Effects of gate-last and gate-first process on deep submicron inversion-mode InGaAs n-channel metal-oxide-semiconductor field effect transistors
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2008 ◽
Vol 47
(4)
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pp. 2633-2635
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1997 ◽
Vol 144
(10)
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pp. 3659-3664
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1998 ◽
Vol 37
(Part 1, No. 10)
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pp. 5437-5443
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Vol 149
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pp. 23-31
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2001 ◽
Vol 40
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pp. 5893-5899
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